LEADER 01073nam a2200277 i 4500
001 991003066919707536
005 20021031120611.0
008 020318s1996    us            ||| | eng  
020   $a0471954772$cLire 517.300
035   $ab11749799-39ule_inst
035   $aLE02615120$9ExL
040   $aDip.to Ingegneria dell'Innovazione$bita
082 0 $a621.38152
100 1 $aLavernia, J. Enrique$0530266
245 10$aSpray atomization and deposition /$cEnrique J. Lavernia and Yue Wu
260   $aNew York [etc] :$bJ. Wiley,$cc 1996
300   $axii, 627 p. :$bill. ;$c24 cm
650  4$aSemiconduttori - Tecnologia
650  4$aSpray atomization
700 1 $aWu, Yue$eauthor$4http://id.loc.gov/vocabulary/relators/aut$0735950
907   $a.b11749799$b21-09-06$c05-11-02
912   $a991003066919707536
945   $aLE026 621.38152 LAV 01.01 1996$g1$i2026000011981$lle026$op$pE0.00$q-$rl$s-  $t4$u0$v0$w0$x0$y.i11989804$z05-11-02
996   $aSpray atomization and deposition$91454015
997   $aUNISALENTO
998   $ale026$b01-01-02$cm$da  $e-$feng$gus $h0$i1