LEADER 01264cam a2200325 a 4500
001 991002310519707536
008 131021s2005    njua     b    001 0 eng d
020   $a9780471720010
035   $ab14154110-39ule_inst
040   $aBibl. Dip.le Aggr. Matematica e Fisica - Sez. Fisica$beng
082 00$a530.4/4$222
084   $aLC QC718.5.D9
084   $a53.6.5
100 1 $aLieberman, Michael A.$027911
245 10$aPrinciples of plasma discharges and materials processing /$cMichael A. Lieberman, Allan J. Lichtenberg
250   $a2nd ed.
260   $aHoboken, N.J. :$bWiley-Interscience,$cc2005
300   $axxxv, 757 p. :$bill. ;$c25 cm
504   $aIncludes bibliographical references (p. 735-748) and index
650  0$aPlasma dynamics
650  0$aThin films$xSurfaces
650  0$aPlasma etching
650  0$aPlasma chemistry$xIndustrial applications
700 1 $aLichtenberg, Allan J.
907   $a.b14154110$b28-01-14$c21-10-13
912   $a991002310519707536
945   $aLE006 53.6.5 LIE$g1$i2006000171038$lle006$op$pE128.29$q-$rl$s-  $t0$u1$v0$w1$x0$y.i1558799x$z28-01-14
996   $aPrinciples of plasma discharges and materials processing$9261560
997   $aUNISALENTO
998   $ale006$b21-10-13$cm$da  $e-$feng$gnju$h0$i0