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040   $aBibl. Dip.le Aggr. Matematica e Fisica - Sez. Fisica$beng
082 00$a530.4/4$222
084   $aLC QC718.5.D9
084   $a53.6.5
100 1 $aLieberman, Michael A.$027911
245 10$aPrinciples of plasma discharges and materials processing /$cMichael A. Lieberman, Allan J. Lichtenberg
250   $a2nd ed.
260   $aHoboken, N.J. :$bWiley-Interscience,$cc2005
300   $axxxv, 757 p. :$bill. ;$c25 cm
504   $aIncludes bibliographical references (p. 735-748) and index
650  0$aPlasma dynamics
650  0$aThin films$xSurfaces
650  0$aPlasma etching
650  0$aPlasma chemistry$xIndustrial applications
700 1 $aLichtenberg, Allan J.
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996   $aPrinciples of plasma discharges and materials processing$9261560
997   $aUNISALENTO
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