LEADER 00867nam a2200265 i 4500
001 991001320859707536
005 20020507114414.0
008 960520s1956    uk            ||| | eng  
035   $ab10204283-39ule_inst
035   $aLE00645815$9ExL
040   $aDip.to Fisica$bita
084   $a53.7.8
084   $a53.8.3
084   $aTS695
100 1 $aHolland, L.$02717
245 10$aVacuum deposition of thin films /$cL. Holland
260   $aLondon :$bChapman and Hall,$c1956
300   $a555 p. ;$c23 cm.
650  4$aVapor-plating
907   $a.b10204283$b21-09-06$c27-06-02
912   $a991001320859707536
945   $aLE006 53.7.8+53.8.3 HOL$g1$i2006000097192$lle006$o-$pE0.00$q-$rl$s-  $t0$u1$v0$w1$x0$y.i10252356$z27-06-02
996   $aVacuum deposition of thin films$9192231
997   $aUNISALENTO
998   $ale006$b01-01-96$cm$da  $e-$feng$guk $h0$i1