LEADER 01266nam a2200325 i 4500
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008 960420s1989    us            ||| | eng  
020   $a1558990194
035   $ab10188964-39ule_inst
035   $aLE00643966$9ExL
040   $aDip.to Fisica$bita
084   $a53.8
084   $a53.9.1
084   $aTK7871.85
110 2 $aMRS$0462574
245 10$aRapid thermal annealing-chemical vapor deposition and integrated processing :$bSymposium held April 25-28, 1989, San Diego CA /$cedited by David Hodul...[et al.]
260   $aPittsburgh :$bMaterials Research Society,$c1989
300   $axi, 494 p. :$bill. ;$c24 cm.
490 0 $aMRS Symposium Proceedings ;$v146
650  4$aSemiconductor doping$xCongresses
650  4$aSemiconductors-Heat treatment$xCongresses
650  4$aVapor-plating$xCongresses
700 1 $aHodul, David
907   $a.b10188964$b17-02-17$c27-06-02
912   $a991001210109707536
945   $aLE006 53.9.1 HOD$g1$i2006000056892$lle006$o-$pE0.00$q-$rl$s-  $t0$u0$v0$w0$x0$y.i1023293x$z27-06-02
996   $aRapid thermal annealing-chemical vapor deposition and integrated processing$9190022
997   $aUNISALENTO
998   $ale006$b01-01-96$cm$da  $e-$feng$gus $h0$i1