LEADER 01173nam a2200337 i 4500
001 991001037629707536
005 20020507105449.0
008 010228s1976    uk            ||| | eng  
020   $a0126969507
035   $ab10164716-39ule_inst
035   $aLE00641087$9ExL
040   $aDip.to Fisica$bita
084   $a53.7.16
084   $a53.7.18
084   $a530.4'1
084   $aQC702.7
100 1 $aTownsend, P.D.$0462579
245 10$aIon implantation, sputtering and their applications /$cby P.D. Townsend, J.C. Kelly, N.E.W. Hartley
260   $aLondon ; New York :$bAcademic Press,$c1976
300   $aix, 333 p. :$bill. ;$c24 cm.
500   $aIncludes bibliographies and index.
650  4$aIon implantation
650  4$aSputtering (Physics)
700 1 $aKelly, John Clive
700 1 $aHartley, N.E.W.
907   $a.b10164716$b21-09-06$c27-06-02
912   $a991001037629707536
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996   $aIon implantation, sputtering and their applications$9188890
997   $aUNISALENTO
998   $ale006$b01-01-01$cm$da  $e-$feng$guk $h0$i1