LEADER 01282nam a2200337 i 4500 001 991001037569707536 005 20020507105448.0 008 010126s1970 us ||| | eng 020 $a0124808506 035 $ab10164704-39ule_inst 035 $aLE00641086$9ExL 040 $aDip.to Fisica$bita 084 $a53.7.18 084 $a621.3.2.4 084 $a621.381'52 084 $aTK7871.85 100 1 $aEriksson, Lennart$049151 245 10$aIon implantation in semiconductors, silicon and germanium /$c[by] James W. Mayer, Lennart Eriksson and John A. Davies 260 $aNew York :$bAcademic Press,$c1970 300 $axiii, 280 p. :$bill. ;$c24 cm. 500 $aIncludes bibliographical references. 650 4$aIon implantation 650 4$aSemiconductors 700 1 $aDavies, John Arthur 907 $a.b10164704$b21-09-06$c27-06-02 912 $a991001037569707536 945 $aLE006 53.7.18 MAY$g1$i2006000058933$lle006$o-$pE0.00$q-$rl$s- $t0$u1$v0$w1$x0$y.i10200423$z27-06-02 945 $aLE006 53.7.18 MAY$g2$i2006000171960$lle006$o-$pE0.00$q-$rl$s- $t0$u0$v0$w0$x0$y.i10200435$z27-06-02 996 $aIon implantation in semiconductors, silicon and germanium$9188891 997 $aUNISALENTO 998 $ale006$b01-01-01$cm$da $e-$feng$gus $h0$i2