LEADER 01433nlm 2200289z- 450 001 996458048303316 005 20220304115738.0 010 $a978-3-8288-7766-5 100 $a20211110c2021---- -u- - 101 0 $ager 102 $aDE 135 $adrcnu 200 1 $aDoing mandir, doing k?vil$fCarolin Zwilling 210 1 $cNomos$d2021 215 $aTesto elettronico (PDF) (350 p.) 225 2 $aReligionen aktuell$v32 230 $aBase dati testuale 330 $aQuesto studio dettagliato negli studi religiosi vuole essere un contributo allo studio degli induismi. Ricostruisce le pratiche dei templi indů a Zurigo e Vienna, rappresentative di due contesti nazionali. Il focus č sulla questione dell'esecuzione pratica degli eventi nel tempio indů, cioč la questione di quali pratiche creano un tempio in quanto tale. Impegnato in un approccio etnometodologico, lo studio ricostruisce la routine della pratica comune del tempio indů: il "fare mandir". In tal modo, colma una lacuna di ricerca e contribuisce alla creazione di approcci teorici della pratica negli studi religiosi e alla loro traduzione nella concretizzazione della ricerca empirica 410 $aReligionen aktuell$v32 606 0 $aTempli induisti 676 $a726.145 700 1$aZWILLING,$bCarolin$01204691 912 $a996458048303316 959 $aEB 969 $aER 996 $aDoing mandir, doing k?vil$92780320 997 $aUNISA LEADER 05542nam 2200709 a 450 001 9910143579503321 005 20210415232447.0 010 $a1-280-25507-2 010 $a9786610255078 010 $a0-470-36189-1 010 $a0-471-72425-4 010 $a0-471-72424-6 035 $a(CKB)1000000000355165 035 $a(EBL)227410 035 $a(OCoLC)59760348 035 $a(SSID)ssj0000227432 035 $a(PQKBManifestationID)11173572 035 $a(PQKBTitleCode)TC0000227432 035 $a(PQKBWorkID)10264338 035 $a(PQKB)11277038 035 $a(MiAaPQ)EBC227410 035 $a(PPN)156584948 035 $a(EXLCZ)991000000000355165 100 $a20041013d2005 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aPrinciples of plasma discharges and materials processing$b[electronic resource] /$fMichael A. Lieberman, Allan J. Lichtenberg 205 $a2nd ed. 210 $aHoboken, N.J. $cWiley-Interscience$dc2005 215 $a1 online resource (795 p.) 300 $aDescription based upon print version of record. 311 $a0-471-72001-1 320 $aIncludes bibliographical references (p. 735-748) and index. 327 $aPRINCIPLES OF PLASMA DISCHARGES AND MATERIALS PROCESSING; CONTENTS; PREFACE; PREFACE TO THE FIRST EDITION; SYMBOLS AND ABBREVIATIONS; PHYSICAL CONSTANTS AND CONVERSION FACTORS; PRACTICAL FORMULAE; 1 INTRODUCTION; 1.1 Materials Processing; 1.2 Plasmas and Sheaths; Plasmas; Sheaths; 1.3 Discharges; Radio Frequency Diodes; High-Density Sources; 1.4 Symbols and Units; 2 BASIC PLASMA EQUATIONS AND EQUILIBRIUM; 2.1 Introduction; 2.2 Field Equations, Current, and Voltage; Maxwell's Equations; 2.3 The Conservation Equations; Boltzmann's Equation; Macroscopic Quantities; Particle Conservation 327 $aMomentum ConservationEnergy Conservation; Summary; 2.4 Equilibrium Properties; Boltzmann's Relation; Debye Length; Quasi-neutrality; Problems; 3 ATOMIC COLLISIONS; 3.1 Basic Concepts; Elastic and Inelastic Collisions; Collision Parameters; Differential Scattering Cross Section; 3.2 Collision Dynamics; Center-of-Mass Coordinates; Energy Transfer; Small Angle Scattering; 3.3 Elastic Scattering; Coulomb Collisions; Polarization Scattering; 3.4 Inelastic Collisions; Atomic Energy Levels; Electric Dipole Radiation and Metastable Atoms; Electron Ionization Cross Section 327 $aElectron Excitation Cross SectionIon-Atom Charge Transfer; Ion-Atom Ionization; 3.5 Averaging Over Distributions and Surface Effects; Averaging Over a Maxwellian Distribution; Energy Loss per Electron-Ion Pair Created; Surface Effects; Problems; 4 PLASMA DYNAMICS; 4.1 Basic Motions; Motion in Constant Fields; E x B Drifts; Energy Conservation; 4.2 Nonmagnetized Plasma Dynamics; Plasma Oscillations; Dielectric Constant and Conductivity; Ohmic Heating; Electromagnetic Waves; Electrostatic Waves; 4.3 Guiding Center Motion; Parallel Force; Adiabatic Constancy of the Magnetic Moment 327 $aDrift Due to Motion Along Field Lines (Curvature Drift)Drift Due to Gyration (Gradient Drift); Polarization Drift; 4.4 Dynamics of Magnetized Plasmas; Dielectric Tensor; The Wave Dispersion; 4.5 Waves in Magnetized Plasmas; Principal Electron Waves; Principal Waves Including Ion Dynamics; The CMA Diagram; 4.6 Wave Diagnostics; Interferometer; Cavity Perturbation; Wave Propagation; Problems; 5 DIFFUSION AND TRANSPORT; 5.1 Basic Relations; Diffusion and Mobility; Free Diffusion; Ambipolar Diffusion; 5.2 Diffusion Solutions; Boundary Conditions; Time-Dependent Solution 327 $aSteady-State Plane-Parallel SolutionsSteady-State Cylindrical Solutions; 5.3 Low-Pressure Solutions; Variable Mobility Model; Langmuir Solution; Heuristic Solutions; 5.4 Diffusion Across a Magnetic Field; Ambipolar Diffusion; 5.5 Magnetic Multipole Confinement; Magnetic Fields; Plasma Confinement; Leak Width w; Problems; 6 DIRECT CURRENT (DC) SHEATHS; 6.1 Basic Concepts and Equations; The Collisionless Sheath; 6.2 The Bohm Sheath Criterion; Plasma Requirements; The Presheath; Sheath Potential at a Floating Wall; Collisional Sheaths; Simulation Results; 6.3 The High-Voltage Sheath 327 $aMatrix Sheath 330 $aA Thorough Update of the Industry Classic on Principles of Plasma ProcessingThe first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals.The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics 606 $aPlasma dynamics 606 $aThin films$xSurfaces 606 $aPlasma etching 606 $aPlasma chemistry$xIndustrial applications 615 0$aPlasma dynamics. 615 0$aThin films$xSurfaces. 615 0$aPlasma etching. 615 0$aPlasma chemistry$xIndustrial applications. 676 $a530.4/4 676 $a530.44 700 $aLieberman$b M. A$g(Michael A.)$0905837 701 $aLichtenberg$b Allan J$027130 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910143579503321 996 $aPrinciples of plasma discharges and materials processing$92026067 997 $aUNINA LEADER 01608aam 2200433I 450 001 9910711231303321 005 20260430110354.0 024 8 $aGOVPUB-C13-fbfb148331335c93fd77784ccfd4c3e8 035 $a(CKB)5470000002481710 035 $a(OCoLC)929065820 035 $a(DGPO)001078296 035 $a(EXLCZ)995470000002481710 100 $a20151113d1983 ua 0 101 0 $aeng 181 $2rdacontent 182 $2rdamedia 183 $2rdacarrier 200 10$aUncertainties in extracting radiation parameters for an unknown interference source based on power and phase measurements /$fMark T. Ma 210 1$aGaithersburg, MD :$cU.S. Dept. of Commerce, National Institute of Standards and Technology,$d1983. 215 $a1 online resource 225 1 $aNBS technical note ;$v1064 300 $a1983. 300 $aContributed record: Metadata reviewed, not verified. Some fields updated by batch processes. 300 $aTitle from PDF title page. 320 $aIncludes bibliographical references. 606 $aElectromagnetic interference 606 $aElectromagnetic measurements 615 0$aElectromagnetic interference. 615 0$aElectromagnetic measurements. 700 $aMa$b Mark T$01390795 701 $aMa$b Mark T$01390795 712 02$aUnited States.$bNational Bureau of Standards. 801 0$bNBS 801 1$bNBS 801 2$bGPO 906 $aBOOK 912 $a9910711231303321 996 $aUncertainties in extracting radiation parameters for an unknown interference source based on power and phase measurements$93513987 997 $aUNINA