LEADER 00847nam0-22002891i-450 
001 990000732270403321
005 20220318090046.0
035   $a000073227
035   $aFED01000073227
035   $a(Aleph)000073227FED01
035   $a000073227
100   $a20001010d1965----km-y0itay50------ba
101 0 $aita
105   $ay-------001yy
200 1 $a<<Il >>duomo di Monreale e l'architettura normanna in Sicilia$fWolfgang Kronig
210   $aPalermo$cFlaccovio$d1965
215   $a322 p.$d36 cm
676   $a726.6094582324$v23
700  1$aKrönig,$bWolfgang$f<1904-1992>$0343374
801  0$aIT$bUNINA$gRICA$2UNIMARC
901   $aBK
912   $a990000732270403321
952   $aARCH C 126$b6824$fFARBC
959   $aFARBC
996   $aDuomo di Monreale e l'architettura normanna in Sicilia$9322085
997   $aUNINA
DB    $aING01

LEADER 02208nas  2200577-a 450 
001 996279733603316
005 20240111213018.0
011   $a1944-026X
035   $a(OCoLC)56123966
035   $a(CKB)1000000000717489
035   $a(CONSER)--2007242215
035   $a(EXLCZ)991000000000717489
100   $a20040810a20029999  s--            a
101 0 $aeng
135   $aur|||||||||||
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 10$aIEEE International Conference on Advanced Thermal Processing of Semiconductors $eRTP
210   $aPiscataway, N.J. $cIEEE$d©2002-
300   $aTitle from PDF of title page (viewed August 10, 2004).
311   $a1944-0251 
517 3 $aRTP
517 3 $aAdvanced thermal processing of semiconductors
517 1 $aRapid Thermal Processing
517 1 $aProceedings of the IEEE International Conference on Advanced Thermal Processing of Semiconductors
531   $aINTERNATIONAL CONFERENCE ON ADVANCED THERMAL PROCESSING OF SEMICONDUCTORS
531 0 $aIEEE Int. Conf. Adv. Therm. Processing Semicond.
606   $aSemiconductors$xHeat treatment$vCongresses
606   $aRapid thermal processing$vCongresses
606   $aSemiconductor doping$vCongresses
606   $aSemiconductors$xDefects$vCongresses
606   $aRapid thermal processing$2fast$3(OCoLC)fst01090061
606   $aSemiconductor doping$2fast$3(OCoLC)fst01112124
606   $aSemiconductors$xDefects$2fast$3(OCoLC)fst01112211
606   $aSemiconductors$xHeat treatment$2fast$3(OCoLC)fst01112224
608   $aPeriodicals.$2fast
608   $aConference papers and proceedings.$2fast
615  0$aSemiconductors$xHeat treatment
615  0$aRapid thermal processing
615  0$aSemiconductor doping
615  0$aSemiconductors$xDefects
615  7$aRapid thermal processing.
615  7$aSemiconductor doping.
615  7$aSemiconductors$xDefects.
615  7$aSemiconductors$xHeat treatment.
676   $a537.622
906   $aCONFERENCE
912   $a996279733603316
996   $aIEEE International Conference on Advanced Thermal Processing of Semiconductors$91888527
997   $aUNISA