LEADER 01356oam 2200349z- 450 001 996279733003316 005 20090620090349.0 010 $a1-5090-8215-8 035 $a(CKB)1000000000331798 035 $a(EXLCZ)991000000000331798 100 $a20220614c2007uuuu -u- - 101 0 $aeng 200 10$a15th IEEE International Conference on Advanced Thermal Processing of Semiconductors--RTP 2007 $eOctober 2-5, 2007, Grand Hotel Baia Verde, Catania, Italy /$fIEEE Electron Devices Society 210 $cIEEE 311 $a1-4244-1227-7 311 $a1-4244-1228-5 517 $a2007 15th International Conference on Advanced Thermal Processing of Semiconductors 517 $aComputer and Automation Engineering 606 $aSemiconductors$xHeat treatment$vCongresses 606 $aRapid thermal processing$vCongresses 606 $aSemiconductor doping$vCongresses 606 $aSemiconductors$xDefects$vCongresses 615 0$aSemiconductors$xHeat treatment 615 0$aRapid thermal processing 615 0$aSemiconductor doping 615 0$aSemiconductors$xDefects 676 $a621.3815/2 712 02$aIEEE Electron Devices Society. 906 $aPROCEEDING 912 $a996279733003316 996 $a15th IEEE International Conference on Advanced Thermal Processing of Semiconductors--RTP 2007$92871341 997 $aUNISA