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035   $a(PQKBTitleCode)TC0001284244
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100   $a20160829d2007      uy              
101 0 $aeng
181   $ctxt
182   $cc
183   $acr
200 10$aEMLC 2007 : 23rd European Mask and Lithography Conference : 22-25 January 2007, Grenoble, France
210 31$a[Place of publication not identified]$cSPIE$d2007
225 0 $aProceedings of SPIE EMLC 2007 
300   $aBibliographic Level Mode of Issuance: Monograph
311   $a0-8194-6655-7 
606   $aIntegrated circuits$xMasks$vCongresses
606   $aMicrolithography$vCongresses
606   $aElectrical & Computer Engineering$2HILCC
606   $aEngineering & Applied Sciences$2HILCC
606   $aElectrical Engineering$2HILCC
615  0$aIntegrated circuits$xMasks
615  0$aMicrolithography
615  7$aElectrical & Computer Engineering
615  7$aEngineering & Applied Sciences
615  7$aElectrical Engineering
676   $a621.3815/31
702   $aMaurer$b Wilhelm
702   $aWaelpoel$b Jacques
702   $aBehringer$b Uwe F. W
712 02$aSociety of Photo Optical Instrumentation Engineers
801  0$bPQKB
906   $aBOOK
912   $a996279650603316
996   $aEMLC 2007 : 23rd European Mask and Lithography Conference : 22-25 January 2007, Grenoble, France$92877301
997   $aUNISA