LEADER 01268nam  2200397   450 
001 996215980503316
005 20180320142856.0
035   $a(CKB)3460000000003672
035   $a(WaSeSS)IndRDA00095805
035   $a(EXLCZ)993460000000003672
100   $a20180320d2011      ||             |
101 0 $aeng
135   $aur|||||||||||
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 10$a22nd European Mask and Lithography Conference $e23-26 January 2006
210  1$aNew York :$cIEEE,$d2011.
215   $a1 online resource (175 pages)
311   $a0-8194-6356-6 
311   $a3-8007-2931-8 
606   $aMicrolithography$vCongresses
606   $aIntegrated circuits$xMasks$vCongresses
615  0$aMicrolithography
615  0$aIntegrated circuits$xMasks
676   $a621.3815
701   $aBehringer$b Uwe F. W$01239199
712 02$aVDE/VDI-Gesellschaft fu?r Mikroelektronik, Mikro- und Feinwerktechnik.
712 02$aBACUS (Technical group)
712 02$aSociety of Photo-optical Instrumentation Engineers.
801  0$bWaSeSS
801  1$bWaSeSS
906   $aPROCEEDING
912   $a996215980503316
996   $a22nd European Mask and Lithography Conference$92875433
997   $aUNISA