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100   $a20160829d2006      uy              
101 0 $aeng
181   $ctxt
182   $cc
183   $acr
200 10$aExtended abstracts of the sixth International Workshop on Junction Technology : May 15-16, 2006, Shanghai, China : IWTJ-2006
210 31$a[Place of publication not identified]$cIEEE$d2006
300   $aBibliographic Level Mode of Issuance: Monograph
311   $a1-4244-0047-3 
606   $aSemiconductors$xJunctions$vCongresses
606   $aSemiconductors$xDesign and construction$vCongresses
606   $aIntegrated circuits$xVery large scale integration$xDesign and construction$vCongresses
606   $aElectrical & Computer Engineering$2HILCC
606   $aEngineering & Applied Sciences$2HILCC
606   $aElectrical Engineering$2HILCC
615  0$aSemiconductors$xJunctions
615  0$aSemiconductors$xDesign and construction
615  0$aIntegrated circuits$xVery large scale integration$xDesign and construction
615  7$aElectrical & Computer Engineering
615  7$aEngineering & Applied Sciences
615  7$aElectrical Engineering
676   $a621.3815/2
702   $aJiang$b Yu-Long
702   $aJiang$b Yu-Long
712 12$aInternational Workshop on Junction Technology
801  0$bPQKB
906   $aPROCEEDING
912   $a996207711003316
996   $aExtended abstracts of the sixth International Workshop on Junction Technology : May 15-16, 2006, Shanghai, China : IWTJ-2006$92539073
997   $aUNISA