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101 0 $aeng
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 00$aMicrolithography world
210   $aPort Washington, N.Y. $cPenn Well Publication, published in cooperation with SPIE$d[1992]-2008
215   $a1 online resource
300   $aTitle from cover.
300   $aPublished: Tulsa, OK, Oct., Nov., Dec. 1993-
311   $aPrint version: Microlithography world. 1074-407X 
531   $aMICROLITHOGR WORLD
531 0 $aMicrolithogr. world
606   $aSemiconductors$xDesign and construction$vPeriodicals
606   $aMicrolithography$vPeriodicals
606   $aMasks (Electronics)$vPeriodicals
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606   $aMicrolithography$2fast$3(OCoLC)fst01019883
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606   $aMicrolithografie$2gtt
608   $aPeriodicals.$2fast
608   $aPeriodicals.$2lcgft
615  0$aSemiconductors$xDesign and construction
615  0$aMicrolithography
615  0$aMasks (Electronics)
615  7$aMasks (Electronics)
615  7$aMicrolithography.
615  7$aSemiconductors$xDesign and construction.
615 17$aMicrolithografie.
676   $a621.3815/31
712 02$aSociety of Photo-optical Instrumentation Engineers.
906   $aJOURNAL
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920   $aexl_impl conversion
996   $aMicrolithography world$92189939
997   $aUNISA