LEADER 01965oam  2200529zu 450 
001 996206561303316
005 20210807003511.0
035   $a(CKB)111055184271198
035   $a(SSID)ssj0000455306
035   $a(PQKBManifestationID)12203246
035   $a(PQKBTitleCode)TC0000455306
035   $a(PQKBWorkID)10399673
035   $a(PQKB)10383448
035   $a(EXLCZ)99111055184271198
100   $a20160829d1996      uy              
101 0 $aeng
181   $ctxt
182   $cc
183   $acr
200 10$a1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA
210 31$a[Place of publication not identified]$cNorthern California Chapter of the American Vacuum Society$d1996
300   $aBibliographic Level Mode of Issuance: Monograph
311   $a0-9651577-0-9 
606   $aSemiconductor wafers$xCongresses
606   $aSemiconductors$xCongresses$xEffect of radiation on
606   $aPlasma radiation$xCongresses
606   $aElectrical & Computer Engineering$2HILCC
606   $aElectrical Engineering$2HILCC
606   $aEngineering & Applied Sciences$2HILCC
615  0$aSemiconductor wafers$xCongresses
615  0$aSemiconductors$xCongresses$xEffect of radiation on
615  0$aPlasma radiation$xCongresses
615  7$aElectrical & Computer Engineering
615  7$aElectrical Engineering
615  7$aEngineering & Applied Sciences
676   $a621.3815/2
702   $aCheung$b Kin P
702   $aGabriel$b Calvin T
702   $aNakamura$b Moritaka
712 02$aIEEE Electron Devices Society
712 02$aAmerican Vacuum Society
712 12$aInternational Symposium on Plasma Process-Induced Damage
801  0$bPQKB
906   $aBOOK
912   $a996206561303316
996   $a1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA$92527830
997   $aUNISA