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100   $a20160829d1998      uy              
101 0 $aeng
181   $ctxt
182   $cc
183   $acr
200 10$a1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA
210 31$a[Place of publication not identified]$cNorthern California Chapter of the American Vacuum Society$d1998
300   $aBibliographic Level Mode of Issuance: Monograph
311   $a0-9651577-2-5 
606   $aSemiconductor wafers$xDefects$vCongresses
606   $aSemiconductors$xEffect of radiation on$vCongresses
606   $aPlasma etching$vCongresses
606   $aElectrical & Computer Engineering$2HILCC
606   $aEngineering & Applied Sciences$2HILCC
606   $aElectrical Engineering$2HILCC
615  0$aSemiconductor wafers$xDefects
615  0$aSemiconductors$xEffect of radiation on
615  0$aPlasma etching
615  7$aElectrical & Computer Engineering
615  7$aEngineering & Applied Sciences
615  7$aElectrical Engineering
676   $a621.3815/2
702   $aHook$b Terence
702   $aNakamura$b Moritaka
702   $aDao$b Leanne Thuy Lien
712 02$aAmerican Vacuum Society
712 02$aIEEE Electron Devices Society
712 12$aInternational Symposium on Plasma Process-Induced Damage
801  0$bPQKB
906   $aPROCEEDING
912   $a996206560303316
996   $a1998 3rd International Symposium on Plasma Process-Induced Damage : June 4-5, 1998, Honolulu, Hawaii, USA$92522293
997   $aUNISA