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200 10$a12th IEEE International Conference on Advanced Thermal Processing of Semiconductors : RTP 2004 : September 28-30, 2004, Hilton Portland & Executive Tower, Portland, OR
210 31$a[Place of publication not identified]$cIEEE$d2004
300   $aBibliographic Level Mode of Issuance: Monograph
311   $a0-7803-8477-6 
606   $aSemiconductors$xHeat treatment$vCongresses
606   $aRapid thermal processing$xDefects$vCongresses
606   $aSemiconductor doping$vCongresses
606   $aSemiconductors$vCongresses
606   $aElectrical Engineering$2HILCC
606   $aElectrical & Computer Engineering$2HILCC
606   $aEngineering & Applied Sciences$2HILCC
615  0$aSemiconductors$xHeat treatment
615  0$aRapid thermal processing$xDefects
615  0$aSemiconductor doping
615  0$aSemiconductors
615  7$aElectrical Engineering
615  7$aElectrical & Computer Engineering
615  7$aEngineering & Applied Sciences
676   $a621.3815/2
702   $aGelpey$b Jeffrey C
712 02$aIEEE Electron Devices Society
712 12$aIEEE International Conference on Advanced Thermal Processing of Semiconductors
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996   $a12th IEEE International Conference on Advanced Thermal Processing of Semiconductors : RTP 2004 : September 28-30, 2004, Hilton Portland & Executive Tower, Portland, OR$92536943
997   $aUNISA