LEADER 01023nam--2200349---450- 001 990003313810203316 005 20090917112501.0 010 $a0-12-674780-6 035 $a000331381 035 $aUSA01000331381 035 $a(ALEPH)000331381USA01 035 $a000331381 100 $a20090917d1983----km-y0itay50------ba 101 $aeng 102 $aUS 105 $a||||||||001yy 200 1 $aVacuum technology, thin films and sputtering$ean introduction$fR. V. Stuart 210 $aOrlando [etc.]$cAcademic Press$dcopyr. 1983 215 $aVIII, 151 p.$cill.$d23 cm 606 0 $atecnologia del vuoto 606 0 $aFilm sottili 606 0 $aSpruzzamento catodico 676 $a621.55 700 1$aSTUART,$bR. V.$0605864 801 0$aIT$bsalbc$gISBD 912 $a990003313810203316 951 $a621.55 STU$b11301/CBS$c621.55$d00327663 959 $aBK 969 $aSCI 979 $aRSIAV6$b90$c20090917$lUSA01$h1125 996 $aVacuum technology, thin films and sputtering$91120988 997 $aUNISA