LEADER 01373nam1 2200421 450 001 990001837030203316 005 20040709102525.0 035 $a000183703 035 $aUSA01000183703 035 $a(ALEPH)000183703USA01 035 $a000183703 100 $a20040709d1995----km-y0itay0103----ba 101 0 $aeng 102 $aGB 105 $a||||||||001yy 200 1 $aHandbook of thin film process technology$feditors David A. Glocker, S. Ismat Shah 210 $aBristol ; Philadelphia$cIoP$dc1995- 215 $av.$d31 cm. 300 $aA fogli mobili, aggiornati periodicamente 410 0$12001 454 1$12001 461 1$1001-------$12001 463 \1$1001990001837070203316$12001 $a98/1: Reactive sputtering 463 \1$1001990001837120203316$12001 $a98/2: Recipes for optical materials 463 \1$1001990001837190203316$12001 $a[Supplement] 99/1: Substrate preparation for thin film deposition 606 0 $aFilm sottili$xFisica 676 $a530.4175 702 1$aGLOCKER,$bDavid A. 702 1$aSHAH,$bS. Ismat 801 0$aIT$bsalbc$gISBD 912 $a990001837030203316 951 $a530.4175 HAN$bCBS$c530.4175 959 $aBK 969 $aSCI 979 $aRIVELLI$b90$c20040709$lUSA01$h1023 979 $aRIVELLI$b90$c20040709$lUSA01$h1025 996 $aHandbook of thin film process technology$9949847 997 $aUNISA