LEADER 01381nam1-2200409---450-
001 990001567470203316
005 20040524110725.0
035   $a000156747
035   $aUSA01000156747
035   $a(ALEPH)000156747USA01
035   $a000156747
100   $a20040415d2000----km-y0enga50------ba
101 0 $aeng
102   $aUS
105   $ay|||z|||001yy
200 1 $aSilicon processing for the VLSI Era$fStanley Wolf, Richard N. Tauber
210   $aSunset Beach$cLattice press$d2000-
215   $av.$cill.$d24 cm.
463 \1$1001990001304260203316$12001 $a<<Vol. 2:>> Process integration
463 \1$1001990001567300203316$12001 $a<<Vol. 1:>> Process technology
463 \1$1001990002716280203316$12001 $a<<Vol. 3>> : <<The>> submicron MOSFET
463 \1$1001990002811080203316$12001 $a<<Vol. 4.>> : Deep-submicron process technology
606 0 $aCircuiti integrati VLSI
606 0 $aSilicone
676   $a621.395
700  1$aWOLF,$bStanley$0557421
701  1$aTAUBER,$bRichard N.$08671
801  0$aIT$bsalbc$gISBD
912   $a990001567470203316
951   $a621.395 WOL$bIng.$c621.395
959   $aBK
969   $aTEC
979   $aMARIA$b10$c20040415$lUSA01$h1210
979   $aRENATO$b90$c20040524$lUSA01$h1054
979   $aRENATO$b90$c20040524$lUSA01$h1107
996   $aSilicon processing for the VLSI Era$9937930
997   $aUNISA