LEADER 03897nam 2200661 a 450 001 9911020433203321 005 20200520144314.0 010 $a9786612346200 010 $a9781282346208 010 $a1282346202 010 $a9780470017944 010 $a0470017945 010 $a9780470065419 010 $a0470065419 035 $a(CKB)1000000000357405 035 $a(EBL)290997 035 $a(OCoLC)476048340 035 $a(SSID)ssj0000138763 035 $a(PQKBManifestationID)11158392 035 $a(PQKBTitleCode)TC0000138763 035 $a(PQKBWorkID)10100704 035 $a(PQKB)11779710 035 $a(MiAaPQ)EBC290997 035 $a(PPN)175354006 035 $a(Perlego)2757716 035 $a(EXLCZ)991000000000357405 100 $a20060918d2007 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aDielectric films for advanced microelectronics /$fedited by Mikhail Baklanov, Martin Green, and Karen Maex 210 $aChichester, England ;$aHoboken, NJ $cJohn Wiley & Sons$dc2007 215 $a1 online resource (510 p.) 225 1 $aWiley series in materials for electronic and optoelectronic applications 300 $aDescription based upon print version of record. 311 08$a9780470013601 311 08$a0470013605 320 $aIncludes bibliographical references and index. 327 $tLow and ultralow dielectric constant films prepared by plasma-enhanced chemical vapor deposition /$rA. Grill --$tSpin-on dielectric materials /$rGeraud Dubois, Robert D. Miller, Willi Volksen --$tPositron annihilation spectroscopy /$rDavid W. Gidley, Hua-Gen Peng, Richard Vallery --$tStructure characterization of nanoporous interlevel dielectric thin films with x-ray and neutron radiation /$rChristopher L. Soles ... [et al.] --$tEllipsometric porosimetry /$rMikhail R. Baklanov --$tMechanical and transport properties of low-k dielectrics /$rJ. L. Plawsky ... [et al.] --$tIntegration of low-k dielectric films in damascene processes /$rR. J. O. M. Hoofman ... [et al.] --$tONO structures and oxynitrides in modern microelectronics : material science, characterization and application /$rYakov Roizin, Vladimir Gritsenko --$tMaterial engineering of high-k gate dielectrics /$rAkira Toriumi, Koji Kita --$tPhysical characterization of ultra-thin high-k dielectric /$rT. Conard, H. Bender, W. Vandervorst --$tElectrical characterization of advanced gate dielectrics /$rRobin Degraeve ... [et al.] --$tIntegration issues of high-k gate dielectrics /$rYasuo Nara --$tAnisotropic conductive film (ACF) for advanced microelectronic interconnects /$rYi Li, C. P. Wong. 330 $aThe topic of thin films is an area of increasing importance in materials science, electrical engineering and applied solid state physics; with both research and industrial applications in microelectronics, computer manufacturing, and physical devices. Advanced, high-performance computers, high-definition TV, broadband imaging systems, flat-panel displays, robotic systems, and medical electronics and diagnostics are a few examples of the miniaturized device technologies that depend on the utilization of thin film materials. This book presents an in-depth overview of the novel developments mad 410 0$aWiley series in materials for electronic and optoelectronic applications. 606 $aDielectric films 606 $aMicroelectronics$xMaterials 615 0$aDielectric films. 615 0$aMicroelectronics$xMaterials. 676 $a621.381 701 $aBaklanov$b Mikhail$01628643 701 $aGreen$b Martin$0151860 701 $aMaex$b Karen$01756502 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911020433203321 996 $aDielectric films for advanced microelectronics$94421630 997 $aUNINA