LEADER 01349nam a2200349 i 4500 001 991000813639707536 005 20020506124547.0 008 960304s1983 fr ||| | eng 020 $a2863320246 035 $ab10133264-39ule_inst 035 $aLE00637274$9ExL 040 $aDip.to Fisica$bita 084 $a53(082.2) 084 $a53.3 084 $a53.4 084 $a539.7'212 084 $aQC793.5.9728 111 2 $aRencontres de Moriond on antiproton proton physics and the W discovery$0461096 245 10$aAntiproton proton physics and the W discovery :$bproceedings of the Third Moriond Workshop (La Plagne-Savoie-France, March 13-19, 1983) /$cedited by J. Tran Thanh Van and F. Vannucci 260 $aGif sur Yvette :$bEditions Frontières,$c1983 300 $a665 p. ;$c22 cm. 490 0 $aMoriond Workshop ;$v3 490 0 $aRencontres de Moriond ;$v3 650 4$aProton-antiproton interactions$xCongresses 700 1 $aTran-Thanh-Van, Jean 700 1 $aVannucci, F. 907 $a.b10133264$b17-02-17$c27-06-02 912 $a991000813639707536 945 $aLE006 53(042+082.2) MOR$g1$i2006000034692$lle006$o-$pE0.00$q-$rl$s- $t0$u0$v0$w0$x0$y.i10156732$z27-06-02 996 $aAntiproton proton physics and the W discovery$9185960 997 $aUNISALENTO 998 $ale006$b01-01-96$cm$da $e-$feng$gfr $h0$i1 LEADER 02501nam 2200661 a 450 001 9911019659203321 005 20200520144314.0 010 $a9781118562727 010 $a1118562720 010 $a9781299188426 010 $a1299188427 010 $a9781118562987 010 $a1118562984 010 $a9781118563328 010 $a1118563328 035 $a(CKB)2670000000327576 035 $a(EBL)1120455 035 $a(OCoLC)827207810 035 $a(SSID)ssj0000831525 035 $a(PQKBManifestationID)11442982 035 $a(PQKBTitleCode)TC0000831525 035 $a(PQKBWorkID)10880535 035 $a(PQKB)10076248 035 $a(OCoLC)827948710 035 $a(MiAaPQ)EBC1120455 035 $a(PPN)185354084 035 $a(Perlego)1003521 035 $a(EXLCZ)992670000000327576 100 $a20120208d2012 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aArtificial materials /$fOlivier Vanbesien 210 $aLondon $cISTE ;$aHoboken, N.J. $cWiley$d2012 215 $a1 online resource (364 p.) 225 1 $aISTE 300 $aDescription based upon print version of record. 311 08$a9781848213357 311 08$a1848213352 320 $aIncludes bibliographical references and index. 327 $apt. 1. A few fundamental concepts -- pt. 2. Materials used in a band gap regime -- pt. 3. Materials in an abnormal refraction regime (n<1 and n<0) -- pt. 4. Moving toward applications. 330 $a This book addresses artificial materials including photonic crystals (PC) and metamaterials (MM). The first part is devoted to design concepts: negative permeability and permittivity for negative refraction, periodic structures, transformation optics. The second part concerns PC and MM in stop band regime: from cavities, guides to high impedance surfaces. Abnormal refraction, less than one and negative, in PC and MM are studied in a third part, addressing super-focusing and cloaking. Applications for telecommunications, lasers and imaging systems are also explored. 410 0$aISTE 606 $aMaterials 606 $aSynthetic products 615 0$aMaterials. 615 0$aSynthetic products. 676 $a620.1 700 $aVanbesien$b Olivier$01720594 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911019659203321 996 $aArtificial materials$94417496 997 $aUNINA