LEADER 05720nam 2200721Ia 450 001 9911019635603321 005 20200520144314.0 010 $a9786610854011 010 $a9781280854019 010 $a1280854014 010 $a9783527606665 010 $a3527606661 010 $a9783527606870 010 $a3527606874 035 $a(CKB)1000000000376964 035 $a(EBL)481681 035 $a(OCoLC)70114976 035 $a(SSID)ssj0000207934 035 $a(PQKBManifestationID)11199015 035 $a(PQKBTitleCode)TC0000207934 035 $a(PQKBWorkID)10238819 035 $a(PQKB)10357020 035 $a(MiAaPQ)EBC481681 035 $a(Perlego)2771872 035 $a(EXLCZ)991000000000376964 100 $a20060908d2005 fy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aNanoscale calibration standards and methods $edimensional and related measurements in the micro- and nanometer range /$fedited by Gunter Wilkening, Ludger Koenders 210 $aWeinheim ;$a[Chichester?] $cWiley-VCH$dc2005 215 $a1 online resource (543 p.) 300 $aConference proceedings. 311 08$a9783527405022 311 08$a352740502X 320 $aIncludes bibliographical references and index. 327 $aNanoscale Calibration Standards and Methods; Contents; List of Contributors; Part I Instrumentation - Overview; 1 Metrological Scanning Probe Microscopes - Instruments for Dimensional Nanometrology; 1.1 Introduction; 1.2 High-Resolution Probing Systems; 1.2.1 Sensor Objective with Beam Deflection Detection; 1.2.2 Sensor Objective with Piezolever Module; 1.2.3 Sensor Objective with Tuning Fork Module; 1.2.4 Sensor Head for Combined Scanning Probe and Interference Microscopy; 1.3 Metrology Systems Based on Scanning Probe Microscopes; 1.3.1 Scanning Force Microscopes of Type Veritekt 327 $a1.3.2 Metrological Large Range Scanning Force Microscope1.4 Summary; Acknowledgments; References; 2 Nanometrology at the IMGC; 2.1 Introduction; 2.2 Surface Metrology; 2.2.1 Scanning Probe Microscopy; 2.2.2 Optical Diffractometry; 2.2.3 Stylus Profilometry; 2.3 Atomic Scale Metrology; 2.3.1 Lattice Parameter of Silicon; 2.3.2 Combined Optical and X-Ray Interferometry (COXI); 2.4 Phase-Contrast Topograpy; 2.4.1 Detection of Small Lattice Strain; 2.4.2 Phase-Contrast Imaging; 2.5 Nanobalance; 2.6 Conclusions; References; 3 Metrological Applications of X-ray Interferometry; 3.1 Introduction 327 $a3.2 Measurement of Non-linearity in Optical Interferometers3.3 Combined Optical and X-ray Interferometry; 3.4 Measurement of Small Angles; 3.5 X-ray Interferometry and Scanning Probe Microscopy; 3.6 Conclusions; References; Part II Instrumentation - Long-range Scanning Probe Microscopes; 4 Advances in Traceable Nanometrology with the Nanopositioning and Nanomeasuring Machine; 4.1 Introduction; 4.2 Design and Operation; 4.3 Uncertainty Budget; 4.4 Focus Sensor; 4.5 Measuring Opportunities and Performance with Focus Sensor; 4.6 Focus Probe with SFM Cantilever; 4.7 Conclusion; Acknowledgements 327 $aReferences5 Coordinate Measurements in Microsystems by Using AFM-Probing: Problems and Solutions; 5.1 Introduction; 5.2 Realizing CMMs for Microsystems; 5.3 Problems and Solutions; 5.3.1 Dynamics of Positioning System; 5.3.2 CMM: One-Millimeter Scan; 5.3.3 Measuring Strategies; 5.4 Conclusion and Outlook; References; 6 Metrological Large Range Scanning Force Microscope Applicable for Traceable Calibration of Surface Textures; 6.1 Introduction; 6.2 Instrumentation; 6.2.1 Principle; 6.2.2 Metrological Properties; 6.2.3 Traceability; 6.2.4 Specially Designed Features 327 $a6.3 Measurement Result of a 2D-Grating Standard6.3.1 Measurement Strategy; 6.3.2 Data Evaluation; 6.3.3 Measurement Result of the Mean Pitch Value; 6.3.4 Measurement of the Local Pitch Variation; 6.4 A Selected Measurement Result of a Microroughness Standard; 6.4.1 Measurement Result of a Glass Flatness Standard; 6.4.2 Measurement of a PTB Microroughness Standard; 6.4.3 Comparison of the Roughness Measurement Results Derived from SFM and Stylus Instruments Using Gaussian Filter; 6.4.4 Comparison Using Morphological Filters; 6.4.5 Evaluation Results Using PTB Reference Software 327 $a6.5 Outlook and Conclusion 330 $aThe quantitative determination of the properties of micro- and nanostructures is essential in research and development. It is also a prerequisite in process control and quality assurance in industry. The knowledge of the geometrical dimensions of structures in most cases is the base, to which other physical and chemical properties are linked. Quantitative measurements require reliable and stable instruments, suitable measurement procedures as well as appropriate calibration artefacts and methods. The seminar ""NanoScale 2004"" (6th Seminar on Quantitative Microscopy and 2nd Seminar on Nanoscal 606 $aMicrostructure$xMeasurement$vCongresses 606 $aNanostructured materials$xMeasurement$vCongresses 606 $aScientific apparatus and instruments$xCalibration$vCongresses 606 $aStereology$vCongresses 615 0$aMicrostructure$xMeasurement 615 0$aNanostructured materials$xMeasurement 615 0$aScientific apparatus and instruments$xCalibration 615 0$aStereology 676 $a620.50287 701 $aKoenders$b Ludger$01841030 701 $aWilkening$b Gunter$01841031 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911019635603321 996 $aNanoscale calibration standards and methods$94420627 997 $aUNINA