LEADER 05637nam 22007213u 450 001 9911007011503321 005 20250320003047.0 035 $a(CKB)2670000000616540 035 $a(EBL)2051700 035 $a(SSID)ssj0001561856 035 $a(PQKBManifestationID)16204484 035 $a(PQKBTitleCode)TC0001561856 035 $a(PQKBWorkID)14833078 035 $a(PQKB)10329663 035 $a(CaSebORM)9781782422556 035 $a(MiAaPQ)EBC2051700 035 $a(EXLCZ)992670000000616540 100 $a20150525d2015|||| u|| | 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aEpitaxial Growth of Complex Metal Oxides $eTechniques, Properties and Applications 210 $aBurlington $cElsevier Science$d2015 215 $a1 online resource (505 p.) 225 1 $aWoodhead Publishing Series in Electronic and Optical Materials 300 $aDescription based upon print version of record. 311 08$a9781782422556 311 08$a1782422552 311 08$a9781782422457 311 08$a1782422455 327 $aFront Cover; Related titles; Epitaxial Growth of Complex Metal OxidesWoodhead Publishing Series in Electronic and Optical Materials: Number 76Edited byG ...; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part 1 - Epitaxial growth of complex metal oxides; 1 - Growth studies of heteroepitaxial oxide thin films using reflection high-energy electron diffraction (RHEED); 1.1 Introduction: reflection high-energy electron diffraction and pulsed laser deposition; 1.2 Basic principles of RHEED1 327 $a1.3 Variations of the specular intensity during deposition1.4 RHEED intensity variations during heteroepitaxy: examples; 1.5 Conclusions; Acknowledgments; References; 2 - Sputtering techniques for epitaxial growth of complex oxides; 2.1 Introduction; 2.2 General considerations for sputtering of complex oxides; 2.3 A practical guide to the sputtered growth of perovskite titanate ferroelectrics; 2.4 Conclusions; References; 3 - Hybrid molecular beam epitaxy for the growth of complex oxide materials; 3.1 Introduction; 3.2 Metal-organic precursors for oxide hybrid molecular beam epitaxy (HMBE) 327 $a3.3 Deposition kinetics of binary oxides from metal-organic (MO) precursors3.4 Opening a growth window with MO precursors; 3.5 Properties of materials grown by hybrid oxide molecular beam epitaxy (MBE); 3.6 Limitations of HMBE and future developments; Acknowledgments; References; 4 - Chemical solution deposition techniques for epitaxial growth of complex oxides; 4.1 Introduction; 4.2 Reagents and solvents; 4.3 Types of chemical solution deposition (CSD) processes; 4.4 Film and pattern formation; 4.5 Crystallization, densification and epitaxy; 4.6 Examples of CSD-derived oxide films 327 $a4.7 ConclusionsReferences; 5 - Epitaxial growth of superconducting oxides; 5.1 Introduction; 5.2 Overview of epitaxial growth of superconducting oxides; 5.3 Requirements for growth of high-quality complex metal-oxide films by molecular-beam epitaxy (MBE); 5.4 Case studies; 5.5 Synthesis of new superconductors by thin-film growth methods; 5.6 Conclusions and future trends; 5.7 Sources of further information and advice; Acknowledgments; References; 6 - Epitaxial growth of magnetic-oxide thin films; 6.1 Introduction; 6.2 Magnetism and major magnetic-oxide systems 327 $a6.3 The effects of thin-film epitaxy on magnetism6.4 Characterization of magnetic-oxide thin films; 6.5 Applications of epitaxial magnetic-oxide thin films; 6.6 Future of epitaxy of complex-oxide magnets; Acknowledgments; References; Part 2 - Properties and analytical techniques; 7 - The effects of strain on crystal structure and properties during epitaxial growth of oxides; 7.1 Introduction; 7.2 Crystal structures of perovskites and related oxides; 7.3 Lattice mismatch-induced stress accommodation in oxide thin films 327 $a7.4 Effect of misfit strain-induced distortions on transport and magnetic properties 330 $aThe atomic arrangement and subsequent properties of a material are determined by the type and conditions of growth leading to epitaxy, making control of these conditions key to the fabrication of higher quality materials. Epitaxial Growth of Complex Metal Oxides reviews the techniques involved in such processes and highlights recent developments in fabrication quality which are facilitating advances in applications for electronic, magnetic and optical purposes. Part One reviews the key techniques involved in the epitaxial growth of complex metal oxides, including growth studies using reflec 410 0$aWoodhead Publishing Series in Electronic and Optical Materials 606 $aEpitaxy 606 $aThin films -- Surfaces 606 $aThin films, Multilayered 606 $aMaterials Science$2HILCC 606 $aChemical & Materials Engineering$2HILCC 606 $aEngineering & Applied Sciences$2HILCC 615 4$aEpitaxy. 615 4$aThin films -- Surfaces. 615 4$aThin films, Multilayered. 615 7$aMaterials Science 615 7$aChemical & Materials Engineering 615 7$aEngineering & Applied Sciences 676 $a621.38152 700 $aKoster$b Gertjan$f1971-$01825074 701 $aHuijben$b M$01825075 701 $aRijnders$b Guus$01825076 801 0$bAU-PeEL 801 1$bAU-PeEL 801 2$bAU-PeEL 906 $aBOOK 912 $a9911007011503321 996 $aEpitaxial Growth of Complex Metal Oxides$94392532 997 $aUNINA