LEADER 04437nam 2200661Ia 450 001 9911006794703321 005 20200520144314.0 010 $a9781680151008 010 $a1680151002 010 $a9780819492524 010 $a0819492523 024 7 $a10.1117/3.975276 035 $a(CKB)2670000000233339 035 $a(EBL)1224003 035 $a(SSID)ssj0000702203 035 $a(PQKBManifestationID)11416408 035 $a(PQKBTitleCode)TC0000702203 035 $a(PQKBWorkID)10679340 035 $a(PQKB)11258212 035 $a(MiAaPQ)EBC1224003 035 $a(OCoLC)805233701 035 $a(CaBNVSL)gtp00552709 035 $a(SPIE)9780819492524 035 $a(PPN)237370344 035 $a(Perlego)2605809 035 $a(EXLCZ)992670000000233339 100 $a20120807d2012 fy 0 101 0 $aeng 135 $aurbn||||m|||a 181 $ctxt 182 $cc 183 $acr 200 10$aOptical scattering $emeasurement and analysis /$fJohn C. Stover 205 $a3rd ed. 210 $aBellingham, Wash. $cSPIE$d2012 215 $a1 online resource (332 p.) 225 1 $aSPIE Press monograph ;$vPM224 300 $aDescription based upon print version of record. 311 08$a9780819492517 311 08$a0819492515 320 $aIncludes bibliographical references (p. 283-302) and index. 327 $aPreface to the first edition -- Preface to the second edition -- Acknowledgments for the second edition -- Preface to the third edition -- Acknowledgments for the third edition -- List of acronyms -- Chapter 1. Quantifying light scatter -- Chapter 2. Quantifying surface roughness -- Chapter 3. Scatter calculations and diffraction theory -- Chapter 4. Using Rayleigh-Rice to calculate smooth-surface statistics from the BRDF -- Chapter 5. Polarization of scattered light -- Chapter 6. Scattering models for discrete surface features -- Chapter 7. Instrumentation and measurement issues -- Chapter 8. Predicting scatter from roughness -- Chapter 9. Detection of discrete defects -- Chapter 10. Appearance and scattered light -- Chapter 11. Industrial applications -- Chapter 12. Published scatter standards -- Chapter 13. Scatter specifications -- Appendix A. Review of electromagnetic wave propagation -- Appendix B. Kirchhoff diffraction from sinusoidal gratings -- Appendix C. BSDF data -- Appendix D. Units -- References -- Works consulted. 330 $aThe first edition of this book concentrated on relating scatter from optically smooth surfaces to the microroughness on those surfaces. After spending six years in the semiconductor industry, Dr. Stover has updated and expanded the third edition. Newly included are scatter models for pits and particles as well as the use of wafer scanners to locate and size isolated surface features. New sections cover the multimillion-dollar wafer scanner business, establishing that microroughness is the noise, not the signal, in these systems. Scatter measurements, now routinely used to determine whether small-surface features are pits or particles and inspiring new technology that provides information on particle material, are also discussed. These new capabilities are now supported by a series of international standards, and a new chapter reviews those documents. New information on scatter from optically rough surfaces has also been added. Once the critical limit is exceeded, scatter cannot be used to determine surface-roughness statistics, but considerable information can still be obtained - especially when measurements are made on mass-produced products. Changes in measurement are covered, and the reader will find examples of scatter measurements made using a camera for a fraction of the cost and in a fraction of the time previously possible. The idea of relating scatter to surface appearance is also discussed, and appearance has its own short chapter. After all, beauty is in the eye of the beholder, and what we see is scattered light. 410 0$aSPIE monograph ;$v224. 606 $aLight$xScattering 606 $aOptics 615 0$aLight$xScattering. 615 0$aOptics. 676 $a535/.43 700 $aStover$b John C$0118720 712 02$aSociety of Photo-Optical Instrumentation Engineers. 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911006794703321 996 $aOptical scattering$94390547 997 $aUNINA