LEADER 02551nam 2200553Ia 450 001 9911006673103321 005 20200520144314.0 010 $a0-8155-1761-0 010 $a1-59124-364-5 035 $a(CKB)111056552536408 035 $a(EBL)3008681 035 $a(SSID)ssj0000072214 035 $a(PQKBManifestationID)11125411 035 $a(PQKBTitleCode)TC0000072214 035 $a(PQKBWorkID)10091640 035 $a(PQKB)11292537 035 $a(MiAaPQ)EBC3008681 035 $a(EXLCZ)99111056552536408 100 $a19930624d1993 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aHandbook of multilevel metallization for integrated circuits $ematerials, technology, and applications /$fedited by Syd R. Wilson and Clarence J. Tracy, John L. Freeman, Jr 210 $aPark Ridge, N.J., U.S.A. $cNoyes$dc1993 215 $a1 online resource (912 p.) 225 1 $aMaterials science and process technology series 300 $aDescription based upon print version of record. 311 $a0-8155-1340-2 320 $aIncludes bibliographical references and index. 327 $a""Preface""; ""Contributors""; ""Table of Contents""; ""1 INTRODUCTION""; ""2 SILICIDES AND CONTACTS FOR ULSI""; ""3 ALUMINUM BASED MULTILEVEL METALLIZATIONS IN VLSI/ULSICs""; ""4 INORGANIC DIELECTRICS""; ""5 ORGANIC DIELECTRICS IN MULTILEVEL METALLIZATION OF INTEGRATED CIRCUITS""; ""6 PLANARIZATION TECHNIQUES""; ""7 LITHOGRAPHY AND ETCH ISSUES FOR A MULTILEVEL METALLIZATION SYSTEM""; ""8 ELECTRO- AND STRESS MIGRATION IN MLM INTERCONNECT STRUCTURES""; ""9 MULTILEVEL METALLIZATION TEST VEHICLE""; ""10 MANUFACTURING AND ANALYTIC METHODS"" 327 $a""11 CHARACTERIZATION TECHNIQUES FOR VLSI MULTILEVEL METALLIZATION""""12 ELECTRONIC PACKAGING AND ITS INFLUENCES ON INTEGRATED CIRCUIT DESIGN AND PROCESSING""; ""13 FUTURE INTERCONNECT SYSTEMS""; ""INDEX"" 410 0$aMaterials science and process technology series. 606 $aIntegrated circuits$xDesign and construction 606 $aMetallizing 615 0$aIntegrated circuits$xDesign and construction. 615 0$aMetallizing. 676 $a621.3815 701 $aWilson$b Syd R$01824181 701 $aTracy$b Clarence J$01824182 701 $aFreeman$b John L$033071 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911006673103321 996 $aHandbook of multilevel metallization for integrated circuits$94391261 997 $aUNINA