LEADER 04240nam 2200625 a 450 001 9911006548403321 005 20200520144314.0 010 $a1-283-61976-8 010 $a9786613932211 010 $a1-4377-7882-8 035 $a(CKB)3360000000445981 035 $a(EBL)1032939 035 $a(OCoLC)818815156 035 $a(SSID)ssj0000767261 035 $a(PQKBManifestationID)12306424 035 $a(PQKBTitleCode)TC0000767261 035 $a(PQKBWorkID)10748892 035 $a(PQKB)10682531 035 $a(MiAaPQ)EBC1032939 035 $a(WaSeSS)IndRDA00070411 035 $a(EXLCZ)993360000000445981 100 $a20121004d2013 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aDevelopments in surface contamination and cleaning$hVolume five$iContaminant removal and monitoring /$fedited by Rajiv Kohli and K.L. Mittal 210 $aAmsterdam $cElsevier$d2013 215 $a1 online resource (241 p.) 300 $aDescription based upon print version of record. 311 $a1-4377-7881-X 320 $aIncludes bibliographical references and index. 327 $aFront Cover; Developments in Surface Contamination and Cleaning: Contaminant Removal and Monitoring; Copyright; Contents; Preface; About the Editors; Contributors; Chapter 1 - Surface Contamination Removal Using Dense-Phase Fluids: Liquid and Supercritical Carbon Dioxide; 1. INTRODUCTION; 2. SURFACE CLEANLINESS LEVELS; 4. PRINCIPLES OF DENSE-PHASE CO2 CLEANING; 5. ADVANTAGES AND DISADVANTAGES OF DENSE-PHASE CO2 CLEANING; 6. APPLICATIONS; 7. SUMMARY AND CONCLUSIONS; ACKNOWLEDGMENT; DISCLAIMER; REFERENCES 327 $aChapter 2 - Plasma Cleaning for Electronic, Photonic, Biological, and Archeological Applications1. INTRODUCTION; 2. PLASMA REACTOR CONFIGURATIONS; 3. SEMICONDUCTOR MANUFACTURING; 4. PHOTOVOLTAIC CELL PROCESSING; 5. PLASMA STERILIZATION; 6. PLASMA CLEANING IN THE RESTORATION INDUSTRY; 7. PLASMA CLEANING APPLICATIONS IN ELECTRON MICROSCOPY; 8. ADDITIONAL PLASMA APPLICATIONS; 9. SUMMARY AND FUTURE NEEDS; REFERENCES; Chapter 3 - Clean Room Wipers for Removal of Surface Contamination; 1. PRINCIPLES OF WIPING FOR REMOVAL OF CONTAMINANTS; 2. TYPES OF WIPERS; 3. WIPER TESTING 327 $a4. METHODS TO ASSESS WIPER QUALITY5. THE IMPORTANCE OF AUTOMATION; 6. APPLICATIONS; 7. CURRENT TRENDS IN WIPER TECHNOLOGY; 8. FUTURE DEVELOPMENTS IN CLEAN ROOM WIPERS; REFERENCES; Chapter 4 - Impact of Microbial Surface Contamination and Effective Environment Monitoring System in Pharmaceutical Manufacturing; 1. INTRODUCTION; 2. IMPACT OF MICROORGANISMS IN THE ENVIRONMENT; 3. SANITIZATION; 4. ENVIRONMENTAL MONITORING; 5. ENVIRONMENTAL CONTAMINATION CONTROL; 6. FUTURE DEVELOPMENTAL REQUIREMENTS; REFERENCES 327 $aChapter 5 - Neutron Holography as a Technique for Probing Local Atomic Structures on the Nanoscale1. INTRODUCTION; 2. BASIC CONCEPTS; 3. EXPERIMENTAL REQUIREMENTS; 4. EXAMPLES; 5. OUTLOOK; REFERENCES; Index 330 $a In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or dealing with the consequences of surface contamination. This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and 606 $aSurfaces (Technology)$xInspection 606 $aSurface contamination$xPrevention 606 $aParticles$xMeasurement 615 0$aSurfaces (Technology)$xInspection. 615 0$aSurface contamination$xPrevention. 615 0$aParticles$xMeasurement. 676 $a620.44 676 $a660.6 701 $aKohli$b Rajiv$0312362 701 $aMittal$b K. L$01185827 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911006548403321 996 $aDevelopments in surface contamination and cleaning$94390211 997 $aUNINA