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010   $a9786612002762
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100   $a19890809d1990      uy         0
101 0 $aeng
135   $aurcn|||||||||
181   $ctxt
182   $cc
183   $acr
200 00$aHandbook of plasma processing technology $efundamentals, etching, deposition, and surface interactions /$fedited by Stephen M. Rossnagel, Jerome J. Cuomo, William D. Westwood
210   $aPark Ridge, N.J., U.S.A. $cNoyes Publications$dc1990
215   $a1 online resource (548 p.) 
225 1 $aMaterials science and process technology series
300   $aBibliographic Level Mode of Issuance: Monograph
311 08$a1-59124-297-5 
311 08$a0-8155-1764-5 
311 08$a0-8155-1220-1 
320   $aIncludes bibliographical references and index.
330   $aThis is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
410  0$aMaterials science and process technology series.
606   $aPlasma engineering
606   $aSemiconductors$xEtching
606   $aPlasma etching
615  0$aPlasma engineering.
615  0$aSemiconductors$xEtching.
615  0$aPlasma etching.
676   $a621.044
701   $aRossnagel$b Stephen M$01823566
701   $aCuomo$b J. J$01823567
701   $aWestwood$b William D$g(William Dickson),$f1937-$01823568
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9911006507503321
996   $aHandbook of plasma processing technology$94390296
997   $aUNINA