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100   $a20050831d2006      uy         0
101 0 $aeng
135   $aurbn||||m|||a
181   $ctxt
182   $cc
183   $acr
200 00$aEUV sources for lithography /$f[edited by] Vivek Bakshi
210   $aBellingham, Wash. $cSPIE Press$dc2006
215   $a1 online resource (1094 p.)
225 1 $aSPIE Press monograph ;$vPM149
300   $aDescription based upon print version of record.
311   $a0-8194-5845-7 
320   $aIncludes bibliographical references and index.
327   $asection 1. Introduction and technology review -- section 2. Fundamentals and modeling -- section 3. Plasma pinch soureces -- section 4. Laser-produced plasma (LPP) sources -- section 5. EUV source metrology -- section 6. Other types of EUV sources -- section 7. EUV source components.
330   $aThis comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and in-depth explanation of EUV source requirements, to fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), to a description of prominent DPP and LPP designs and other technologies for producing EUV radiation. Additional topics include EUV source metrology and components (collectors, electrodes), debris mitigation, and mechanisms of component erosion in EUV sources. The volume is intended to meet the needs of both practitioners of the technology and readers seeking an introduction to the subject.
410  0$aSPIE Press monograph ;$vPM149.
606   $aUltraviolet radiation$xIndustrial applications
606   $aExtreme ultraviolet lithography
606   $aPlasma (Ionized gases)
606   $aLithography
615  0$aUltraviolet radiation$xIndustrial applications.
615  0$aExtreme ultraviolet lithography.
615  0$aPlasma (Ionized gases)
615  0$aLithography.
676   $a621.36/4
701   $aBakshi$b Vivek$01823797
712 02$aSociety of Photo-optical Instrumentation Engineers.
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9911004829503321
996   $aEUV sources for lithography$94390751
997   $aUNINA