LEADER 11829nam 2200697 a 450 001 9910973261003321 005 20251117091625.0 010 $a1-62100-237-3 035 $a(CKB)2550000000058484 035 $a(EBL)3021923 035 $a(SSID)ssj0000570085 035 $a(PQKBManifestationID)12162337 035 $a(PQKBTitleCode)TC0000570085 035 $a(PQKBWorkID)10587082 035 $a(PQKB)11427182 035 $a(MiAaPQ)EBC3021923 035 $a(Au-PeEL)EBL3021923 035 $a(CaPaEBR)ebr10686246 035 $a(OCoLC)757395191 035 $a(BIP)29639942 035 $a(EXLCZ)992550000000058484 100 $a20100506d2012 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aSynthesis and engineering of nanostructures by energetic ions /$fDevesh Kumar Avasthi and Jean Claude Pivin, editors 205 $a1st ed. 210 $aNew York $cNova Science Publishers, Inc.$dc2012 215 $a1 online resource (390 p.) 225 1 $aNanotechnology science and technology 225 1 $aNovinka 300 $aDescription based upon print version of record. 311 08$a1-61668-209-4 320 $aIncludes bibliographical references and index. 327 $aIntro -- SYNTHESIS AND ENGINEERING OF NANOSTRUCTURES BY ENERGETIC IONS -- SYNTHESIS AND ENGINEERING OF NANOSTRUCTURES BY ENERGETIC IONS -- CONTENTS -- PREFACE -- A. SYNTHESIS OF NANOCOMPOSITE THIN FILM AND NANOSTRUCTURES AT SURFACE BY LOW ENERGY ION BEAMS -- ENERGETIC ION BEAMS IN NANOSTRUCTURING: AN OVERVIEW -- 1. INTRODUCTION: -- 2. ION OF ENERGIES UPTO A FEW MEV IN SYNTHESIS OF NANOSTRUCTURES -- 2.1. Synthesis of Nanocomposite Thin Films by Atom Beam Co-Sputtering -- 2.2. Creation of Nanoripples at Surface by KeV Ion Beams -- 2.3. Buried Nanostructures by Ion Implantation -- 2.4. Buried Nanostructures by Ion Beam Mixing -- 2.5. Precipitation Resulting from Electronic Energy Deposited by Ions -- 3. HIGH ENERGY (SWIFT HEAVY IONS) IN SYNTHESIS OF THE NANOSTRUCTURES -- 3.1. Creation of Carbon Nanowire in Si Based Gels -- 3.2. Creation of Carbon Nanowires in Fullerene -- 3.3. Si and Ge Nanoparticles by SHI Irradiation of Si and Ge Suboxide -- 3.4. Reduction of Copper Oxide Nanoparticles by SHI -- 3.5. Latent Tracks as Templates for Nanostructures -- 3.6. Ion Tracks in Polymers for Grafting Functional Monomers -- 4. HIGH ENERGY (SWIFT HEAVY IONS) IN MODIFYING THE NANOSTRUCTURES -- 4.1. Engineering the Size of Buried Nanostructures -- 4.2. Engineering the Shape of Nanoparticles Embedded in Silica -- 4.3. Influence of SHI on Magnetic Nanoparticles of Fe Embedded in Silica -- 5. FOCUSED ION BEAMS FOR NANO STRUCTURES -- CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES -- NANOFABRICATION BY FOCUSED ION BEAMS -- ABSTRACT -- 1. INTRODUCTION -- 2. FOCUSED ION BEAM SYSTEM -- 3. PRINCIPLES OF FIB MICRO FABRICATION -- 4. FABRICATION STEPS -- 5. APPLICATION WITH EXAMPLES -- 5.1 Nanostructures by FIB Milling -- 5.2 3D nanostructures by FIB CVD deposition -- 5.3 Morphology and Stoichiometry -- 5.4 Nano Size Sensors -- SUMMARY -- ACKNOWLEDGMENT -- REFERENCES. 327 $aSYNTHESIS OF NANOCOMPOSITE THIN FILMS BY ATOM BEAM CO-SPUTTERING -- ABSTRACT -- 1. INTRODUCTION -- 2. ATOM BEAM SPUTTERING SET UP FOR SYNTHESIS OF NANOCOMPOSITE THIN FILMS -- 3. SYNTHESIS AND CHARACTERIZATION OF PLASMONIC NANOCOMPOSITES -- 3.1. Gold-Silica Nanocomposites -- 3.2. Au-Si Core-Shell Nps Embedded in Silica -- 4. SYNTHESIS AND CHARACTERIZATION OF GE-SILICA NANOCOMPOSITES -- 5. SYNTHESIS ND CHARACTERIZATION OF NI DOPED ZNO -- 6. MECHANISM OF NUCLEATION AND GROWTH OF NPS IN THE CO-SPUTTERING PROCESS -- CONCLUSION -- REFERENCES -- LOW ENERGY ION BEAM ASSISTED DEPOSITION OF TIN-NI NANOCOMPOSITE COATINGS -- ABSTRACT -- 1. INTRODUCTION -- 2. DEPOSITION AND CHARACTERIZATION OF HARD COATINGS (TIN-NI NANOCOMPOSITES) -- 2.1. Deposition -- 2.2. Chemical Composition and Phase Characterization -- 2.3. Residual Stress Measurement -- 2.4. Hardness and Tribology -- 3. ANALYSIS OF CHARACTERIZATION OF TIN-NI NANOCOMPOSITE THIN FILM -- 3.1. Chemical Composition and Microstructural Analysis -- 3.2. Internal Stresses -- 3.3. Hardness and Thermal Stability -- 3.4. Wear Resistance -- 3.5. Qualitative Coating Toughness Evaluation -- DISCUSSION- CONCLUSION -- REFERENCES -- NANOSTRUCTURED SOFT MAGNETIC FILMS: ELABORATION, PERFORMANCES AND APPLICATIONS FOR TRILAYERED SENSORS BASED ON MAGNETO-IMPEDANCE EFFECT -- ABSTRACT -- 1. INTRODUCTION -- 2. WHY A MI SENSOR? WHY TRILAYERED STRUCTURE? WHY INDUSTRY WANTS TO REDUCE SENSOR SIZE? -- 3. ELABORATION ROUTE AND CHARACTERIZATIONS -- 4. BENEFITS OF ANNEALINGS -- 5. SENSOR: FIRST MAGNETO-IMPEDANCE RESULTS -- CONCLUSION -- ACKNOWLEDGMNTS -- REFERENCES -- FORMATION AND INTERROGATION OF METAL AND SEMICONDUCTOR NANOSTRUCTURES BY KEV ION BEAMS -- ABSTRACT -- 1. INTRODUCTION -- 2. THEORY OF ION INDUCED SURFACE MORPHOLOGY -- SURFACE DIFFUSION -- 2.1. Linear B-H Equation -- LIMITATIONS OF THE LINEAR B-H EQUATION. 327 $a2.2. The Continuum Equation of Makeev, Cuerno and Barabasi (MCB) for Ion Bombarded Surface -- 3. A BRIEF REVIEW OF ION INDUCED SURFACE MORPHOLOGY -- 3.1. Ion Induced Kinetic Roughening -- 3.2. Formation of Regular Structures by Ion Bombardment -- 4. ION INDUCED NANOSTRUCTURES ON METAL THIN FILMS -- 4.1. Kinetic Roughening of Thin Pt Films on Si Substrate -- 4.2. ION BEAM SPUTTERING INDUCED DOT AND RIPPLE FORMATION IN THIN METAL FILMS -- Variation of Surface Morphology with Ion Incidence Angle -- Metal Dot Formation -- Metal Ripple Formation -- 4.3. FORMATION AND INTERROGATION OF AU NANO CLUSTER BY ION BEAMS -- 5. ION INDUCED NANOSTRUCTURES ON SEMICONDUCTORS -- 5.1. Formation of Ripples and Faceted Structures on Oxygen Bombarded Si Surface -- 5.2. Coulomb Explosion Sputtering of Oxidized Nano Structure -- 5.3. Role of Initial Surface Roughness on Ion Induced Surface Morphology -- SUMMARY -- ACKNOWLEDGMENTS -- REFERENCES -- X-RAY SCATTERING STUDIES OF NANODOT PATTERN FORMATION ON SEMICONDUCTOR SURFACES BY LOW ENERGY ION BEAM SPUTTERING -- ABSTRACT -- 1. INTRODUCTION -- 2. GRAZING-INCIDENCE X-RAY SCATTERING TECHNIQUES -- 3. EXPERIMENTAL DETAILS -- 3.1. Self-Organized Nanopattern Production -- 3.2 Pattern Characterization -- 4 - EXPERIMENTAL OBSERVATIONS AND DISCUSSION -- 4.1 Temperature Dependence of Nanopattern Formation on Si(001) -- 4.2 In-Situ Study of Nanopattern Formation on Gasb(001) -- CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES -- B. SYNTHESIS OF BURIED NANOSTRUCTURES BY ION IMPLANTATION PROCESS -- CONTROLLING IRRADIATION-INDUCED QUANTUM DOT SYNTHESIS -- ABSTRACT -- 1. INTRODUCTION -- 2. WHAT DETERMINES THE NC RADIUS AND SIZE DISTRIBUTION? -- 2.1 Nucleation -- 2.2 Growth and Coarsening -- 3. ROLE OF CHEMISTRY IN BEAM-INDUCED NC NUCLEATION AND GROWTH -- CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES. 327 $aSYNTHESIS AND PACKAGING OF NANOCRYSTALS BY ULTRA LOW ENERGY ION IMPLANTATION FOR APPLICATIONS IN ELECTRONICS, OPTICS AND PLASMONICS -- ABSTRACT -- 1. INTRODUCTION -- 2. THE ULE-IBS METHOD -- 2.1 The Classical IBS Method for the Fabrication of Nanocrystals -- 2.2 Advantages of the ULE-IBS Method -- 3. DEPTH POSITIONING OF THE NCS LAYERS WITHIN THE MATRIX -- 4. OPTIMIZATION OF THE NCS DENSITY -- 4.1 The "Dose Loss" Problem in Si Implanted SiO2 -- 4.2 Anomalous Swelling of the SiO2 Layers -- 5. HUMIDITY PENETRATION INTO IMPLANTED LAYERS -- 6. NCS PASSIVATION AND OXIDE HEALING -- 7. APPLICATIONS -- 7.1Nanocrystal Memory Devices -- 7.2 Plasmonic Nanostructures -- CONCLUSION AND FUTURE DIRECTIONS -- REFERENCES -- NANOMETRIC BUBBLE FORMATION IN SIO2 BY ION IMPLANTATION: INFLUENCE OF THE SUBSTRATE -- ABSTRACT: -- 1. INTRODUCTION -- 2. EXPERIMENTAL CONDITIONS -- 3. CHARACTERIZATION OF NANO SIZE KR BUBBLES IN SI02 -- 3.1. Thermal Si02 -- 3.2. CVD SiO2 -- 3.3. Densified SiO2 -- 3.4 Discussion -- 4. CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES -- HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY STUDIES OF ION BEAM INDUCED MODIFICATIONS IN GOLD NANOSTRUCTURES ON SILICON: SPUTTERING AND ENHANCED DIFFUSION -- ABSTRACT -- INTRODUCTION -- Transmission Electron Microscopy (TEM): -- Uses of Electron Microscopy: -- (A) Determination of Size and Size Distributions: -- (B) Determination of Crystalline Structure: Value of "D", Inter-Planar Spacing -- Sample Preparation -- Ion - Solid Interactions at Nanoscale Regime: -- Experimental Methods -- RESULTS AND DISCUSSIONS: -- (I) Sputtering from AU Nanostructures: -- Enhanced Diffusion in Substrate under High Flux Conditions: -- CONCLUSIONS -- ACKNOWLEDGMENTS -- REFERENCES -- SYNTHESIS AND STUDY OF NANOSCALE MAGNETIC SEMICONDUCTOR AND MAGNETIC METAL/INSULATOR FILMS: ROLE OF ENERGETIC IONS -- ABSTRACT -- 1. INTRODUCTION. 327 $a1.1. Zinc Oxide Based Diluted Magnetic Semiconductor -- 1.1.1. Diluted Magnetic Semiconductor: Material Aspects and Importance -- 1.1.2. Mechanism behind Ferromagnetism -- 1.1.3. Important experimental results of ZnO based DMS -- 1.1.4. Role of Energetic Ions -- 1.2. Metal-Insulator Nanophase Composite Films -- 1.2.1. Material Aspects and Importance -- 1.2.2. Role of Energetic Ions -- 2. SYNTHESIS AND STUDY OF NI DOPED/IMPLANTED ZNO FILMS -- 2.1. Room Temperature Transparent Ferromagnetism in Ni Doped Zno Films -- 2.2. Studies on DMS Properties of 200 Kev Ni+2 Ion Implanted ZnO Films -- 3. SYNTHESIS AND STUDY OF NI :SILICA NANOGRANULAR FILM -- 3.1. Composition Analysis of Ni-SiO2 Films -- 3.2. Correlation Between Properties of Ni:SiO2 Films with Composition and Microstructure -- 5. CONCLUSION -- ACKNOWLEDGMENTS -- REFERENCES -- C. SWIFT HEAVY IONS IN SYNTHESIS AND MODIFICATION OF NANODIMENSIONAL SYSTEMS -- ION TRACKS IN POLYMERS -- ABSTRACT -- 1. INTRODUCTION -- 2. TRACK ETCHED POROUS MEMBRANES AND TEMPLATES -- 3. GRAFTING IN POLYMERIC MEMBRANES -- 4. CLUSTERS SYNTHESIS IN SEMI-ORGANIC POLYMERS: -- 5. CONCLUSIONS -- REFERENCES -- SWIFT HEAVY-IONS FOR CONTROLLED MODIFICATIONS OF MAGNETIC THIN FILMS AND MULTILAYERS -- ABSTRACT -- 1. INTRODUCTION -- 2. STRESS RELAXATION IN SOFT MAGNETIC FILMS USING SWIFT HEAVY IONS -- 2.1. Diffusion Measurements -- 3. CONTROLLED VARIATION IN INTERFACE ROUGHNESS USING SWIFT HEAVY ION IRRADIATION -- 4. SWIFT HEAVY ION INDUCED MIXING AT THE INTERFACES IN MULTILAYERS -- 4.1. Comparison of the Mixing Efficiencies of Different Metals with Si -- 4.2. Depth-Resolved XAFS Study of SHI Induced Phase Formation -- 4.3. Asymmetry of Intermixing Induced by Swift Heavy Ions at the Interfaces -- CONCLUSIONS -- REFERENCES -- ION BEAM INDUCED FORMATION OF CONDUCTING TRACKS IN FULLERENE FILMS -- ABSTRACT -- 1. INTRODUCTION. 327 $aSurface Probe Microscopy. 330 $aMaterials with nanometric dimensions such as nanodots, nanowire, nanotubes, functional structures, multi-layers of low dimensions, have unique properties, which can be tuned by varying their size. This book reviews research on applications and theoretical modelling of ion beams in the field of nanotechnology. 410 0$aNanotechnology science and technology series. 410 0$aNovinka (Series) 606 $aNanostructured materials$xDesign and construction 606 $aNanostructures$xDesign and construction 606 $aIon bombardment$xIndustrial applications 615 0$aNanostructured materials$xDesign and construction. 615 0$aNanostructures$xDesign and construction. 615 0$aIon bombardment$xIndustrial applications. 676 $a620/.5 701 $aAvasthi$b Devesh Kumar$01865136 701 $aPivin$b Jean Claude$01865137 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910973261003321 996 $aSynthesis and engineering of nanostructures by energetic ions$94472175 997 $aUNINA