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010   $a9781608057924
010   $a1608057925
035   $a(CKB)2670000000493937
035   $a(EBL)1572233
035   $a(SSID)ssj0001363004
035   $a(PQKBManifestationID)11831752
035   $a(PQKBTitleCode)TC0001363004
035   $a(PQKBWorkID)11371852
035   $a(PQKB)10710733
035   $a(MiAaPQ)EBC1572233
035   $a(Au-PeEL)EBL1572233
035   $a(CaPaEBR)ebr10817749
035   $a(OCoLC)865331807
035   $a(DE-B1597)731998
035   $a(DE-B1597)9781608057924
035   $a(Perlego)977009
035   $a(EXLCZ)992670000000493937
100   $a20121011d2013      uy         1
101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 10$aIon implantation and activation$hVolume 3 /$fKunihiro Suzuki
205   $a1st ed.
210  1$aSharjah :$cBentham Science Publishers,$d2013.
215   $a1 online resource (212 p.)
225 1 $aIon Implantation and Activation
300   $aDescription based upon print version of record.
311 08$a9781608057931 
311 08$a1608057933 
320   $aIncludes bibliographical references and index.
327   $aCover; Title; EUL; Contents; Preface; Acknowledgement; Chapter 01; Chapter 02; Chapter 03; Chapter 04; Chapter 05; Chapter 06; Chapter 07; Index
330   $aIon Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories.Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling.
410  0$aIon Implantation and Activation
606   $aIon implantation
606   $aIon accelerators
615  0$aIon implantation.
615  0$aIon accelerators.
676   $a621.3815;621.38152
700   $aSuzuki$b Kunihiro$01603009
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910962985503321
996   $aIon implantation and activation$94345401
997   $aUNINA