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100   $a20110613d2011      uy         0
101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 10$aMagneto luminous chemical vapor deposition /$fHirotsugu Yasuda
205   $a1st ed.
210   $aBoca Raton, FL $cTaylor & Francis$d2011
215   $a1 online resource (256 p.)
225 1 $aGreen chemistry and chemical engineering
300   $aDescription based upon print version of record.
311 08$a1-4398-3877-1 
320   $aIncludes bibliographical references.
327   $aFront Cover; Contents; Preface; The Author; Chapter 1: Introduction; Chapter 2: Context of Terms Used and Concepts; Chapter 3: Green Deposition Coating of Nanofilms; Chapter 4: Plasma Phase and Luminous Gas Phase; Chapter 5: Dielectric Breakdown of Gas Phase; Chapter 6: Influence of Magnetic Field on Luminous Gas Phase; Chapter 7: Polymer Formation Mechanism in Luminous Gas; Chapter 8: Operation Parameters and Deposition Kinetics; Chapter 9: Magneto-Luminous Chemical Vapor Deposition; Chapter 10: Applications of Magneto-Luminous Chemical Vapor Deposition; Back Cover
330   $aThe magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the ""front-end green process."" It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the ""back-end green process,"" which calls for add-on processes to deal with effluent problems, the newer MLCVD approach is a completely different phenomenon that has never been adequately described, until now.Dispelling previous misconceptions and revealing new areas for inve
410  0$aGreen chemistry and chemical engineering.
606   $aMagnetochemistry
606   $aChemical vapor deposition
606   $aPhotochemistry
606   $aSurface chemistry
615  0$aMagnetochemistry.
615  0$aChemical vapor deposition.
615  0$aPhotochemistry.
615  0$aSurface chemistry.
676   $a671.7/35
700   $aYasuda$b H$01828530
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910954409503321
996   $aMagneto luminous chemical vapor deposition$94397448
997   $aUNINA