LEADER 01961oam 2200541zu 450 001 9910872957903321 005 20241212215208.0 035 $a(CKB)111055184271206 035 $a(SSID)ssj0000395899 035 $a(PQKBManifestationID)12189669 035 $a(PQKBTitleCode)TC0000395899 035 $a(PQKBWorkID)10457105 035 $a(PQKB)10532172 035 $a(EXLCZ)99111055184271206 100 $a20160829d2000 uy 101 0 $aeng 181 $ctxt 182 $cc 183 $acr 200 10$a2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA 210 31$a[Place of publication not identified]$cNorthern California Chapter of the American Vacuum Society$d2000 300 $aBibliographic Level Mode of Issuance: Monograph 311 08$a9780965157742 311 08$a0965157741 606 $aSemiconductor wafers$xEffect of radiation on$vCongresses 606 $aSemiconductors$vCongresses 606 $aPlasma radiation$vCongresses 606 $aElectrical & Computer Engineering$2HILCC 606 $aEngineering & Applied Sciences$2HILCC 606 $aElectrical Engineering$2HILCC 615 0$aSemiconductor wafers$xEffect of radiation on 615 0$aSemiconductors 615 0$aPlasma radiation 615 7$aElectrical & Computer Engineering 615 7$aEngineering & Applied Sciences 615 7$aElectrical Engineering 676 $a621.3815/2 702 $aGabriel$b Calvin T 702 $aEngelhardt$b Manfred 702 $aKoyanagi$b Mitsumasa 712 02$aIEEE Electron Devices Society 712 02$aAmerican Vacuum Society 712 12$aInternational Symposium on Plasma Process-Induced Damage 801 0$bPQKB 906 $aPROCEEDING 912 $a9910872957903321 996 $a2000 5th International Symposium on Plasma Process-Induced Damage : May 22-24, 2000, Santa Clara, California, USA$92515723 997 $aUNINA