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200 10$a1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA
210 31$a[Place of publication not identified]$cNorthern California Chapter of the American Vacuum Society$d1997
300   $aBibliographic Level Mode of Issuance: Monograph
311 08$a9780965157711 
311 08$a0965157717 
606   $aSemiconductor wafers$xDefects$vCongresses
606   $aSemiconductors$xEffect of radiation on$vCongresses
606   $aPlasma etching$vCongresses
606   $aElectrical & Computer Engineering$2HILCC
606   $aElectrical Engineering$2HILCC
606   $aEngineering & Applied Sciences$2HILCC
615  0$aSemiconductor wafers$xDefects
615  0$aSemiconductors$xEffect of radiation on
615  0$aPlasma etching
615  7$aElectrical & Computer Engineering
615  7$aElectrical Engineering
615  7$aEngineering & Applied Sciences
676   $a621.3815/2
702   $aCheung$b Kin P
702   $aNakamura$b Moritaka
702   $aGabriel$b Calvin T
712 02$aAmerican Vacuum Society
712 02$aIEEE Electron Devices Society
712 12$aInternational Symposium on Plasma Process-Induced Damage
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996   $a1997 2nd International Symposium on Plasma Process-Induced Damage : 13-14 May 1997, Monterey, California, USA$92501004
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