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100   $a20160829d1996      uy 
101 0 $aeng
181   $ctxt
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200 10$a1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA
210 31$a[Place of publication not identified]$cNorthern California Chapter of the American Vacuum Society$d1996
300   $aBibliographic Level Mode of Issuance: Monograph
311 08$a9780965157704 
311 08$a0965157709 
606   $aSemiconductor wafers$vCongresses
606   $aSemiconductors$xEffect of radiation on$vCongresses
606   $aPlasma radiation$xCongresses
606   $aElectrical & Computer Engineering$2HILCC
606   $aElectrical Engineering$2HILCC
606   $aEngineering & Applied Sciences$2HILCC
615  0$aSemiconductor wafers
615  0$aSemiconductors$xEffect of radiation on
615  0$aPlasma radiation$xCongresses.
615  7$aElectrical & Computer Engineering
615  7$aElectrical Engineering
615  7$aEngineering & Applied Sciences
676   $a621.3815/2
702   $aCheung$b Kin P.
702   $aGabriel$b Calvin T
702   $aNakamura$b Moritaka
712 02$aIEEE Electron Devices Society
712 02$aAmerican Vacuum Society
712 12$aInternational Symposium on Plasma Process-Induced Damage
801  0$bPQKB
906   $aBOOK
912   $a9910872918203321
996   $a1996 1st International Symposium on Plasma Process-Induced Damage : 13-14 May 1996, Santa Clara, California, USA$92527830
997   $aUNINA