LEADER 01334oam 2200409zu 450 001 9910872719503321 005 20241212215120.0 035 $a(CKB)111055184236848 035 $a(SSID)ssj0000451327 035 $a(PQKBManifestationID)12184070 035 $a(PQKBTitleCode)TC0000451327 035 $a(PQKBWorkID)10459959 035 $a(PQKB)11610801 035 $a(NjHacI)99111055184236848 035 $a(EXLCZ)99111055184236848 100 $a20160829d1995 uy 101 0 $aeng 135 $aur||||||||||| 181 $ctxt 182 $cc 183 $acr 200 10$aIEEE Conference Record - Abstracts: 1995 IEEE International Conference on Plasma Science 210 31$a[Place of publication not identified]$cIEEE$d1995 215 $a1 online resource $cillustrations 300 $aBibliographic Level Mode of Issuance: Monograph 311 08$a9780780326699 311 08$a0780326695 320 $aIncludes bibliographical references. 606 $aPlasma engineering$vCongresses 615 0$aPlasma engineering 676 $a621.0 712 02$aInstitute of Electrical and Electronics Engineers, Inc. Staff 801 0$bPQKB 906 $aBOOK 912 $a9910872719503321 996 $aIEEE Conference Record - Abstracts: 1995 IEEE International Conference on Plasma Science$92498995 997 $aUNINA