LEADER 01088nam0-22003011i-450- 001 990000548390403321 005 20101025185948.0 035 $a000054839 035 $aFED01000054839 035 $a(Aleph)000054839FED01 035 $a000054839 100 $a20020821d1957----km-y0itay50------ba 101 0 $aeng 102 $aUS 105 $ay-------001yy 200 1 $a<>linearized theory of wave resistance and its applications to ship-shaped bodies in motion on the surface of a deep, previously undisturbed fluid$fJ. K. Lunde 210 $aNew York$cSNAME$d1957 215 $a70 p.$d26 cm 225 1 $aTechnical and research bulletin$fSNAME$v1-18 702 1$aLunde,$bJ. K. 710 02$aSociety of Naval Architects and Marine Engineers$029309 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990000548390403321 952 $a05 60 104$b1169$fDININ 959 $aDININ 996 $aLinearized theory of wave resistance and its applications to ship-shaped bodies in motion on the surface of a deep, previously undisturbed fluid$9329643 997 $aUNINA LEADER 01902oam 2200529zu 450 001 9910872670803321 005 20241212214905.0 035 $a(CKB)111026746722770 035 $a(SSID)ssj0000395351 035 $a(PQKBManifestationID)12144962 035 $a(PQKBTitleCode)TC0000395351 035 $a(PQKBWorkID)10455668 035 $a(PQKB)11072355 035 $a(EXLCZ)99111026746722770 100 $a20160829d1998 uy 101 0 $aeng 181 $ctxt 182 $cc 183 $acr 200 10$aIon implantation technology--1998 : 1998 International Conference on Ion Implantation Technology : Proceedings, Kyoto, Japan, June 22-26, 1998 210 31$a[Place of publication not identified]$cThe Institute of Electrical and Electronics Engineers Inc$d1998 300 $aBibliographic Level Mode of Issuance: Monograph 311 08$a9780780345386 311 08$a078034538X 606 $aSemiconductors$vCongresses 606 $aIon implantation$vCongresses 606 $aSemiconductor doping$vCongresses 606 $aElectrical & Computer Engineering$2HILCC 606 $aEngineering & Applied Sciences$2HILCC 606 $aElectrical Engineering$2HILCC 615 0$aSemiconductors 615 0$aIon implantation 615 0$aSemiconductor doping 615 7$aElectrical & Computer Engineering 615 7$aEngineering & Applied Sciences 615 7$aElectrical Engineering 676 $a621.3815/2 702 $aYamada$b I 702 $aMatsuo$b J 702 $aTakaoka$b G 712 02$aIEEE Electron Devices Society 712 12$aInternational Conference on Ion Implantation Technology 801 0$bPQKB 906 $aPROCEEDING 912 $a9910872670803321 996 $aIon implantation technology--1998 : 1998 International Conference on Ion Implantation Technology : Proceedings, Kyoto, Japan, June 22-26, 1998$92495968 997 $aUNINA