LEADER 01326oam  2200433zu 450 
001 9910872616003321
005 20241212214859.0
024 7 $a10.1109/ASMC.1998
035   $a(CKB)111026746721676
035   $a(SSID)ssj0000455013
035   $a(PQKBManifestationID)12149050
035   $a(PQKBTitleCode)TC0000455013
035   $a(PQKBWorkID)10398738
035   $a(PQKB)10549226
035   $a(NjHacI)99111026746721676
035   $a(EXLCZ)99111026746721676
100   $a20160829d1998      uy 
101 0 $aeng
135   $aur|||||||||||
181   $ctxt
182   $cc
183   $acr
200 10$a1998 IEEE/Semi Advanced Semiconductor Manufacturing Conference and Workshop
210 31$a[Place of publication not identified]$cIEEE$d1998
215   $a1 online resource (500 pages) $cillustrations
300   $aBibliographic Level Mode of Issuance: Monograph
311 08$a9780780343801 
311 08$a0780343808 
606   $aProcess control$vCongresses
606   $aSemiconductor industry$vCongresses
615  0$aProcess control
615  0$aSemiconductor industry
676   $a670.42
712 02$aInstitute of Electrical and Electronics Engineers, Inc. Staff
801  0$bPQKB
906   $aPROCEEDING
912   $a9910872616003321
996   $a1998 IEEE$92508366
997   $aUNINA