LEADER 05162nam 2200649 a 450 001 9910830395003321 005 20230617021410.0 010 $a1-280-52098-1 010 $a9786610520985 010 $a3-527-60632-7 010 $a3-527-60340-9 035 $a(CKB)1000000000019409 035 $a(EBL)481662 035 $a(OCoLC)69245152 035 $a(SSID)ssj0000202409 035 $a(PQKBManifestationID)11196373 035 $a(PQKBTitleCode)TC0000202409 035 $a(PQKBWorkID)10250884 035 $a(PQKB)10074098 035 $a(MiAaPQ)EBC481662 035 $a(EXLCZ)991000000000019409 100 $a20030806d2003 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aMicrooptics$b[electronic resource] /$fStefan Sinzinger, Ju?rgen Jahns 205 $a2nd rev. and enlarged ed. 210 $aWeinheim $cWiley-VCH$dc2003 215 $a1 online resource (453 p.) 300 $aPrevious ed.: 1999. 311 $a3-527-40355-8 320 $aIncludes bibliographical references and index. 327 $aMicrooptics; Preface; Foreword to the Second Edition; Contents; 1 From macrooptics to microoptics - an overview; 1.1 Optics technology; 1.2 Classification of optical hardware; 1.3 Optical functions and their implementation; 1.4 Scope of this book; 1.5 Organization of the book; 1.6 Further reading; 1.7 Acknowledgment; References; 2 Optical components with small dimensions; 2.1 Microlens performance; 2.1.1 Diffraction limit; 2.1.2 Aberrations; 2.1.3 Quality criteria for lens performance; 2.2 Scaling - from macro- to micro-components; 2.2.1 Scaling of diffractive and refractive lenses 327 $a2.2.2 Scaling of prisms2.3 List of symbols; 2.4 Exercises; References; 3 Lithographic fabrication technology; 3.1 Pattern generation; 3.1.1 Plotting and photoreduction; 3.1.2 Laser beam writing; 3.1.3 X-ray and e-beam writing; 3.1.4 Grey-level masks; 3.1.5 Special masks; 3.2 Coating or thin layer deposition; 3.2.1 Spin coating; 3.2.2 Physical vapour deposition (PVD); 3.2.3 Chemical Vapour Deposition (CVD); 3.3 Alignment and exposure; 3.3.1 Exposure geometry; 3.3.2 Light sources for mask lithography; 3.3.3 Illumination with x-ray (synchrotron) and proton radiation; 3.3.4 Multimask alignment 327 $a3.3.5 Through-wafer alignment3.4 Pattern transfer; 3.4.1 Etching; 3.4.2 Laser micromachining - laser initiated ablation; 3.4.3 Mechanical micromachining - diamond turning of microoptical components; 3.4.4 Replication of microrelief structures; 3.4.5 Diffusion - ion-exchange processes; 3.5 Bonding of planar structures; 3.5.1 Flip-chip bonding; 3.5.2 Thermo-anodic bonding; 3.6 List of new symbols; 3.7 Exercises; References; 4 Measurement and characterization of microoptics; 4.1 Physical probing-profilometry; 4.2 Interferometry; 4.2.1 Types of interferometers; 4.2.2 Phase-shifting interferometry 327 $a4.2.3 Evaluation of interferometric measurements4.3 Imaging experiments; 4.4 Array testing; 4.5 List of new symbols; 4.6 Exercises; References; 5 Refractive microoptics; 5.1 Surface profile microlenses; 5.1.1 Melted photoresist lenses - reflow lenses; 5.1.2 Microlens fabrication by mass transport mechanisms in semiconductors; 5.1.3 Microlenses formed by volume change of a substrate material; 5.1.4 Lithographically initiated volume growth in PMMA for microlens fabrication; 5.1.5 Dispensed or droplet microlenses; 5.1.6 Direct writing techniques for refractive microoptics 327 $a5.1.7 Grey-scale lithography for ROE fabrication5.2 Gradient-index (GRIN) optics; 5.2.1 GRIN rod lenses; 5.2.2 Planar GRIN lenses; 5.3 Microprisms and micromirrors; 5.3.1 Lithography for the fabrication of microprisms; 5.3.2 Micromachining of microprisms using single point diamond turning or embossing; 5.3.3 Anisotropic etching of mirror structures in crystalline materials; 5.4 List of new symbols; 5.5 Exercises; References; 6 Diffractive microoptics; 6.1 Trading spatial resolution for reduced phase thickness; 6.1.1 Blazing and phase quantization 327 $a6.1.2 Alternative quantization schemes for microlenses 330 $aMicrooptics is an important enabling technology for many areas of application. In this updated second edition of their modern text and reference book, Stefan Sinzinger and J?rgen Jahns expertly and comprehensively present the basics and applications in microoptics, while incorporating the most important developments in recent years.An absolute must for physicists and electrical engineers, from advanced students right up to designers working in the field. 606 $aIntegrated optics 606 $aOptoelectronic devices 606 $aMiniature electronic equipment 615 0$aIntegrated optics. 615 0$aOptoelectronic devices. 615 0$aMiniature electronic equipment. 676 $a621.381045 700 $aSinzinger$b Stefan$01680974 701 $aJahns$b Jurgen$f1953-$01680975 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910830395003321 996 $aMicrooptics$94050055 997 $aUNINA