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101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 10$aNano-lithography$b[electronic resource] /$fedited by Stefan Landis
205   $a1st edition
210   $aLondon $cISTE ;$aHoboken, N.J. $cWiley$d2011
215   $a1 online resource (353 p.)
225 1 $aISTE
300   $a"Adapted and updated from La nanolithographie published 2010 in France by Hermes Science/Lavoisier"--t.p. verso.
311   $a1-84821-211-9 
320   $aIncludes bibliographical references and index.
327   $aCh. 1. X-ray lithography : fundamentals and applications -- ch. 2. NanoImprint lithography -- ch. 3. Lithography techniques using scanning probe microscopy -- ch. 4. Lithography and manipulation based on the optical properties of metal nanostructures -- ch. 5. Patterning with self-assembling block copolymers -- ch. 6. Metrology for lithography.
330   $aLithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,
410  0$aISTE
606   $aNanolithography
615  0$aNanolithography.
676   $a621.381531
700   $aLandis$b Stefan$01619512
701   $aLandis$b Stefan$01619512
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801  1$bMiAaPQ
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906   $aBOOK
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996   $aNano-lithography$93951793
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