LEADER 05012nam 2200565 450 001 9910829975303321 005 20230801223734.0 010 $a3-527-63573-4 010 $a3-527-63572-6 010 $a3-527-63574-2 035 $a(CKB)2670000000212514 035 $a(EBL)1658410 035 $a(SSID)ssj0000702997 035 $a(PQKBManifestationID)11407018 035 $a(PQKBTitleCode)TC0000702997 035 $a(PQKBWorkID)10687554 035 $a(PQKB)10063221 035 $a(MiAaPQ)EBC1658410 035 $a(EXLCZ)992670000000212514 100 $a20150411h20122012 uy| 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aIndustrial ion sources $ebroadbeam gridless ion source technology /$fViacheslav V. Zhurin 210 1$aWeinheim :$cWiley-VCH,$d[2012] 210 4$dİ2012 215 $a1 online resource (615 p.) 300 $aDescription based upon print version of record. 311 $a3-527-41029-5 320 $aIncludes bibliographical references and index. 327 $aCover; Title Page; Copyright; Related Titles; Preface; References; Chapter 1: Hall-Current Ion Sources; 1.1 Introduction; 1.2 Closed Drift Ion Sources; 1.3 End-Hall Ion Sources; 1.4 Electric Discharge and Ion Beam Volt-Ampere Characteristics; 1.5 Operating Parameters Characterizing Ion Source; Appendix 1.A: Web Addresses; References; Chapter 2: Ion Source and Vacuum Chamber. Influence of Various Effects on Ion Beam Parameters; 2.1 Introduction; 2.2 Mass Entrainment; 2.3 Charge-Exchange Influence on Ion Beam Flow; 2.4 Doubly Ionized Particles and Their Role 327 $a2.5 Influence of Vacuum Chamber Pumping Rate2.6 Dielectric Depositions on an Anode During Operation with Reactive Gases; 2.7 Estimation of Returned Sputtered Particles to Ion Source; 2.8 Influence of Ion Source Heating on its Operation; 2.9 Negative Ions and their Role; 2.10 Conclusion; References; Chapter 3: Oscillations and Instabilities in Hall-Current Ion Sources; 3.1 Introduction; 3.2 Oscillations and Instabilities; 3.3 Types of Oscillations; 3.4 Conclusions and What to Do About Oscillations; References; Chapter 4: Optimum Operation of Hall-Current Ion Sources; 4.1 Introduction 327 $a4.2 Regime of Nonself-Sustained Discharge and Optimum Operation Conditions of End-Hall Ion Source4.3 Operation of End-Hall Ion Source with Excessive Electron Emission; 4.4 Ion Beam Energy of End-Hall Ion Source; 4.5 End-Hall Ion Source Optimum Magnetic Field for Ion Beam Current; 4.6 Ion Beam Energy Distribution as a Function of Angle With Various Emission Currents; 4.7 Conclusion; References; Chapter 5: Cathode Neutralizers for Ion Sources; 5.1 Introduction; 5.2 Ion Beam and its Practical Neutralization; 5.3 Hot Filament Electron Source and Thermoelectron Emission; 5.4 Hollow Cathodes 327 $a5.5 Conclusions about Cathode Neutralizers5.6 Appendix 5.A: Web Addresses; References; Chapter 6: Industrial Gridless Broad-Beam Ion Source Producers, Problems and the Need for Their Standardization; 6.1 World Producers of Ion Sources; 6.2 Specific Designs of End-Hall Current Ion Sources for Thin Film Technology; 6.3 Nontraditional Broad Beam Ion Sources; 6.4 Linear Ion Sources; 6.5 Hall-Current Ion Sources Basic Operation Parameter Problems; 6.6 The Need for Standardization of Ion Sources; 6.7 Conclusions; 6.8 Appendix 6.A: Web Addresses; References 327 $aChapter 7: Operation of Industrial Ion Sources with Reactive Gases7.1 Introduction; 7.2 Low- and High-Temperature Oxidation; 7.3 Ion Source Operation with Dielectric and Insulating Depositions on an Anode; 7.4 End-Hall with Grooved Anode and Baffle; 7.5 End-Hall With Hidden Anode Area for Continuing Discharge Operation; 7.6 Practical Operation of Hall-Current Ion Sources with Reactive Gases; References; Chapter 8: Ion Beam and Radiation Impact on Substrate Heating; 8.1 Introduction; 8.2 Target-Substrate Heating By Radiation and Ion Beam 327 $a8.3 Experimental Measurements of Ion Beam and Radiation Impact on a Target-Substrate 330 $aDue to the large number of uses of ion sources in academia and industry, those who utilize these sources need up to date and coherent information to keep themselves abreast of developments and options, and to chose ideal solutions for quality and cost-effectiveness. This book, written by an author with a strong industrial background and excellent standing, is the comprehensive guide users and developers of ion sources have been waiting for. Providing a thorough refresher on the physics involved, this resource systematically covers the source types, components, and the operational parameters. 606 $aIon sources 615 0$aIon sources. 676 $a541.372 700 $aZhurin$b Viacheslav V.$01615409 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910829975303321 996 $aIndustrial ion sources$93945583 997 $aUNINA LEADER 03023nam 22005415 450 001 9910349470503321 005 20200702151003.0 010 $a981-13-1071-8 024 7 $a10.1007/978-981-13-1071-3 035 $a(CKB)4100000009158623 035 $a(MiAaPQ)EBC5507735 035 $a(DE-He213)978-981-13-1071-3 035 $a(PPN)230534783 035 $a(EXLCZ)994100000009158623 100 $a20180903d2018 u| 0 101 0 $aeng 135 $aurnn|008mamaa 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aApplied Computational Genomics /$fedited by Yin Yao 205 $a2nd ed. 2018. 210 1$aSingapore :$cSpringer Singapore :$cImprint: Springer,$d2018. 215 $a1 online resource (VII, 150 p. 14 illus., 13 illus. in color.) 225 1 $aTranslational Bioinformatics,$x2213-2775 ;$v13 311 $a981-13-1070-X 327 $aIntroduction -- Exploring Polygenic Overlap Between ADHD and OCD -- Concepts of Genetic Epidemiology -- Rare Variants Analysis in Unrelated Individuals -- Whole Genome Association of Treatment Response in OCD -- QTL Mapping of Molecular Traits for Studies of Human Complex Diseases -- From Family Study to Population Study: A History of Genetic Mapping for Nasopharyngeal Carcinoma (NPC) -- Test for Nonlinear Dependence of Two Continuous Variables -- Analytical Approaches for Exome Sequence Data -- Machine Learning Approaches: Data Integration for Disease Prediction and Prognosis -- OCD Genomics and Future Looks. 330 $aThe volume provides a review of statistical development and application in the area of human genomics, including candidate gene mapping, linkage analysis, population-based genome-wide association, exon sequencing, and whole genome sequencing analysis. The authors are extremely experienced in the field of statistical genomics and will give a detailed introduction to the evolution of the field, as well as critical comments on the advantages and disadvantages of the proposed statistical models. The future directions of translational biology will also be described. 410 0$aTranslational Bioinformatics,$x2213-2775 ;$v13 606 $aHuman genetics 606 $aBioinformatics 606 $aBiotechnology 606 $aHuman Genetics$3https://scigraph.springernature.com/ontologies/product-market-codes/B12008 606 $aBioinformatics$3https://scigraph.springernature.com/ontologies/product-market-codes/L15001 606 $aBiotechnology$3https://scigraph.springernature.com/ontologies/product-market-codes/C12002 615 0$aHuman genetics. 615 0$aBioinformatics. 615 0$aBiotechnology. 615 14$aHuman Genetics. 615 24$aBioinformatics. 615 24$aBiotechnology. 676 $a611.01816 676 $a599.935 702 $aYao$b Yin$4edt$4http://id.loc.gov/vocabulary/relators/edt 906 $aBOOK 912 $a9910349470503321 996 $aApplied Computational Genomics$92528874 997 $aUNINA