LEADER 05247nam 2200793Ia 450 001 9910827311103321 005 20251116134626.0 010 $a9781118747407 010 $a1118747402 010 $a9781118747421 010 $a1118747429 010 $a9781118747384 010 $a1118747380 035 $a(CKB)2670000000359991 035 $a(EBL)1192829 035 $a(SSID)ssj0000885740 035 $a(PQKBManifestationID)11932329 035 $a(PQKBTitleCode)TC0000885740 035 $a(PQKBWorkID)10814345 035 $a(PQKB)10557441 035 $a(DLC) 2013016681 035 $a(Au-PeEL)EBL1192829 035 $a(CaPaEBR)ebr10715316 035 $a(CaONFJC)MIL493162 035 $a(FINmELB)ELB179453 035 $a(MiAaPQ)EBC1192829 035 $a(OCoLC)841199237 035 $a(Perlego)1001959 035 $a(EXLCZ)992670000000359991 100 $a20130422d2013 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aAtomic layer deposition $eprinciples, characteristics, and nanotechnology applications /$fTommi Kaariainen ... [et al.] 205 $a2nd ed. 210 $aHoboken, NJ $cJohn Wiley & Sons$dc2013 215 $a1 online resource (272 p.) 300 $aDescription based upon print version of record. 311 08$a9781118062777 311 08$a1118062779 320 $aIncludes bibliographical references and index. 327 $aCover; Title Page; Copyright Page; Contents; Acknowledgements; Foreword; Preface; 1 Fundamentals of Atomic Layer Deposition; 1.1 Chemical Vapour Deposition; 1.1.1 Thermal CVD; 1.1.2 Plasma Enhanced CVD (PECVD); 1.2 Vapour Adsorption; 1.2.1 Physisorption; 1.2.2 Chemisorption; 1.3 Atomic Layer Deposition (ALD); 1.3.1 Thermal ALD Processes; 1.3.2 Radical Enhanced ALD (REALD); 1.3.3 Spatial ALD (SALD); References; 2 Elemental Semiconductor Epitaxial Films; 2.1 Epitaxial Silicon; 2.1.1 Dichlorosilane Processes; 2.1.2 Other Processes; 2.1.3 Epitaxial Germanium; References 327 $a3 III-V Semiconductor Films3.1 Gallium Arsenide; 3.1.1 Organometallic Precursors; 3.1.2 Halogen Precursors; 3.2 Other III-V Semiconductor Films; 3.3 Applications; 3.3.1 Photonic Structures; 3.3.2 Transistors; References; 4 Oxide films; 4.1 Introduction; 4.2 Aluminum Oxide; 4.2.1 Processes and Properties of Aluminum Oxide; 4.3 Titanium Dioxide; 4.3.1 Processes and Properties of TiO2; 4.4 Zinc Oxide; 4.4.1 Processes and Properties of ZnO; 4.5 Zirconium Dioxide; 4.5.1 Processes and Properties of ZrO2; 4.6 Hafnium Dioxide; 4.6.1 Processes and Properties of HfO2; 4.7 Other Oxides; 4.7.1 Tin Oxide 327 $a4.7.2 Indium Oxide4.7.3 Tantalum Oxide; 4.8 Mixed Oxides and Nanolaminates; 4.8.1 Mixed Oxide Processes; 4.8.2 Nanolaminate Oxides; 4.9 Multilayers; References; 5 Nitrides and Other Compounds; 5.1 Introduction; 5.2 Nitrides; 5.2.1 Transition Metal Nitrides; 5.2.2 Group III Nitrides; 5.2.3 Group IV Nitrides; 5.2.4 Mixed Nitrides; 5.3 Chalcogenides; 5.4 Other Compounds; References; 6 Metals; 6.1 Introduction; 6.2 Noble Metals; 6.2.1 Silver Processes and Applications; 6.2.2 Ruthenium Processes and Applications; 6.2.3 Platinum and Palladium Processes and Applications 327 $a6.2.4 Rhrodium Processes and Applications6.2.5 Iridium Processes and Applications; 6.3 Titanium; 6.4 Tantalum; 6.5 Aluminum; 6.6 Copper; 6.7 Other Transition Metals; References; 7 Organic and Hybrid Materials; 7.1 Introduction; 7.2 Organic layers; 7.3 Hybrid Organic-inorganic Layers.; 7.4 Applications of Organic and Hybrid Films; References; 8 ALD Applications and Industry; 8.1 Introduction; 8.2 MEMS/NEMS; 8.3 Thin Film Magnetic Heads; 8.4 Coating Nanoparticles, Nanomaterials and Porous Objects; 8.5 Optical Coatings; 8.6 Thin Film Electroluminescent Displays; 8.7 Solar Cells 327 $a8.8 Anti-corrosion Layers8.9 Opportunities in Organic Electronics; 8.10 ALD Tool Manufacturers and Coating Providers; References; Index 330 $aSince the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials. 606 $aChemical vapor deposition 606 $aEpitaxy 606 $aMicroelectronics 606 $aNanotechnology 615 0$aChemical vapor deposition. 615 0$aEpitaxy. 615 0$aMicroelectronics. 615 0$aNanotechnology. 676 $a620/.5 700 $aKa?a?ria?inen$b Tommi$01695349 701 $aCameron$b David$f1949-$01695350 701 $aKa?a?ria?inen$b Marja-Leena$01695351 701 $aSherman$b Arthur$f1931-$01695352 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910827311103321 996 $aAtomic layer deposition$94074542 997 $aUNINA