LEADER 05561nam 2200673 450 001 9910826847403321 005 20200520144314.0 010 $a0-08-100261-0 010 $a0-08-100250-5 035 $a(CKB)3710000000448745 035 $a(EBL)2097728 035 $a(SSID)ssj0001561931 035 $a(PQKBManifestationID)16204830 035 $a(PQKBTitleCode)TC0001561931 035 $a(PQKBWorkID)14833191 035 $a(PQKB)11670515 035 $a(Au-PeEL)EBL2097728 035 $a(CaPaEBR)ebr11079921 035 $a(CaONFJC)MIL822687 035 $a(OCoLC)914433674 035 $a(MiAaPQ)EBC2097728 035 $a(EXLCZ)993710000000448745 100 $a20150730h20152015 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aDirected self-assembly of block co-polymers for nano-manufacturing /$fedited by Roel Gronheid and Paul Nealey 210 1$aAmsterdam, Netherlands :$cWoodhead Publishing,$d2015. 210 4$dİ2015 215 $a1 online resource (328 p.) 225 1 $aWoodhead Publishing series in electronic and optical materials ;$vNumber 83 300 $aDescription based upon print version of record. 320 $aIncludes bibliographical references at the end of each chapters and index. 327 $aFront Cover; Directed Self-assembly of Block Copolymers for Nano-manufacturing; Copyright; Contents; List of contributors; Woodhead Publishing Series in Electronic and Optical Materials; Part One: Physics and chemistry of block copolymer (BCP) materials ; Chapter 1: Physics of block copolymers from bulk to thin films; 1.1 . Introduction; 1.2 . Order-disorder transition of block copolymers; 1.2.1 . Disordered state; 1.2.2 . Weak segregation limit in ordered state; 1.2.3 . Strong segregation limit in ordered state; 1.2.4 . Phase diagram obtained by using self-consistent field theory 327 $a1.3 . Morphologies of diblock copolymer/homopolymer mixtures1.4 . Dynamics of phase transition in block copolymers; 1.5 . Structures of block copolymer in thin films; 1.5.1 . Free energy of block copolymer thin film; 1.5.2 . Effect of surface energy term; F surface ; 1.5.3 . Effect of bulk energy term F bulk ; 1.6 . Conclusion; References; Chapter 2: RAFT synthesis of block copolymers and their self-assembly properties; 2.1 . RAFT process description; 2.2 . Polymerization process details; 2.2.1 . In situ process analysis; 2.3 . RAFT end-group catalytic radical reduction 327 $a2.4 . Block Copolymer In situ Topcoat Applications2.5 . DSA Applications; 2.6 . High chi block copolymers; 2.7 . Conclusions; Acknowledgments; References; Chapter 3: Thermal and solvent annealing of block copolymer films; 3.1 . Introduction; 3.2 . Thermal annealing of BCPs films; 3.2.1 . Fundamental consideration; 3.2.2 . Film thickness effect and temperature gradient; 3.2.3 . Crystallization behavior induced by thermal annealing; 3.3 . Solvent annealing of BCPs films; 3.3.1 . Fundamental consideration; 3.3.2 . Factors affecting the annealing process 327 $a3.3.3 . Combination of solvent annealing and thermal annealing3.4 . Summary and outlook; References; Chapter 4: Field-theoretic simulations and self-consistent field theory for studying block copolymer directed self-assembly; 4.1 Introduction; 4.2 Overview of field-theory-based simulations of block copolymer DSA; 4.3 Chemoepitaxy modeling; 4.4 Graphoepitaxy modeling; 4.4.1 Cylinders in a rectangular trench; 4.4.2 Contact hole shrink; 4.5 Summary and outlook; References; Part Two: Templates and patterning for directed self-assembly 327 $aChapter 5: Directed self-oriented self-assembly of block copolymers using topographical surfaces5.1 . Introduction; 5.2 . Control of interfacial interactions; 5.3 . Graphoepitaxy; 5.3.1 . Fabrication of topographical surfaces; 5.3.2 . Geometry with deep patterning; 5.3.2.1 . Deep trench surfaces; 5.3.2.2 . Post surfaces; 5.3.2.3 . Other surfaces; 5.3.3 . Geometry with minimal patterning; 5.3.3.1 . Faceted surfaces; 5.3.3.2 . Shallow trench surfaces; 5.4 . Application of BCPs guided by topographical surfaces; 5.5 . Summary and outlook; References 327 $aChapter 6: Directed self-oriented self-assembly of block copolymers using chemically modified surfaces 330 $a The directed self-assembly (DSA) method of patterning for microelectronics uses polymer phase-separation to generate features of less than 20nm, with the positions of self-assembling materials externally guided into the desired pattern. Directed self-assembly of Block Co-polymers for Nano-manufacturing reviews the design, production, applications and future developments needed to facilitate the widescale adoption of this promising technology. Beginning with a solid overview of the physics and chemistry of block copolymer (BCP) materials, Part 1 covers the synthesis of new materials and new 410 0$aWoodhead Publishing series in electronic and optical materials ;$vNumber 83. 606 $aBlock copolymers 606 $aSelf-assembly (Chemistry) 606 $aNanomanufacturing 615 0$aBlock copolymers. 615 0$aSelf-assembly (Chemistry) 615 0$aNanomanufacturing. 676 $a547.84 702 $aGronheid$b Roel 702 $aNealey$b Paul 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910826847403321 996 $aDirected self-assembly of block co-polymers for nano-manufacturing$94021929 997 $aUNINA