LEADER 03965nam 2200661Ia 450 001 9910826412903321 005 20230725052455.0 010 $a1-118-06314-7 010 $a1-283-37153-7 010 $a9786613371539 010 $a0-470-60262-7 010 $a0-470-60263-5 035 $a(CKB)3400000000000257 035 $a(EBL)661647 035 $a(OCoLC)792932606 035 $a(SSID)ssj0000477764 035 $a(PQKBManifestationID)11320093 035 $a(PQKBTitleCode)TC0000477764 035 $a(PQKBWorkID)10514061 035 $a(PQKB)10768687 035 $a(MiAaPQ)EBC661647 035 $a(Au-PeEL)EBL661647 035 $a(CaPaEBR)ebr10510261 035 $a(CaONFJC)MIL337153 035 $a(EXLCZ)993400000000000257 100 $a20100504d2010 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 00$aModern electroplating$b[electronic resource] /$fedited by Mordechay Schlesinger, Milan Paunovic 205 $a5th ed. 210 $aHoboken, NJ $cWiley$dc2010 215 $a1 online resource (749 p.) 225 0 $aThe ECS series of texts and monographs ;$v52 300 $aDescription based upon print version of record. 311 $a0-470-16778-5 320 $aIncludes bibliographical references and index. 327 $aMODERN ELECTROPLATING; CONTENTS; PREFACE; PREFACE TO THE FOURTH EDITION; CONTRIBUTORS; CONVERSION FACTORS; GRAPHICAL CONVERSIONS; THE ELECTROCHEMICAL SOCIETY SERIES; 1 FUNDAMENTAL CONSIDERATIONS; 2 ELECTRODEPOSITION OF COPPER; 3 ELECTRODEPOSITION OF NICKEL; 4 ELECTRODEPOSITION OF GOLD; 5 ELECTROLESS AND ELECTRODEPOSITION OF SILVER; 6 TIN AND TIN ALLOYS FOR LEAD-FREE SOLDER; 7 ELECTRODEPOSITION OF CHROMIUM; 8 ELECTRODEPOSITION OF LEAD AND LEAD ALLOYS; 9 ELECTRODEPOSITION OF TIN-LEAD ALLOYS; 10 ELECTRODEPOSITION OF ZINC AND ZINC ALLOYS; 11 ELECTRODEPOSITION OF IRON AND IRON ALLOYS 327 $a12 PALLADIUM ELECTROPLATING13 ELECTROCHEMICAL DEPOSITION PROCESS FOR ULSI INTERCONNECTION DEVICES; 14 ELECTRODEPOSITION OF SEMICONDUCTORS; 15 DEPOSITION ON NONCONDUCTORS; 16 CONDUCTIVE POLYMERS: ELECTROPLATING OF ORGANIC FILMS; 17 ELECTROLESS DEPOSITION OF COPPER; 18 ELECTROLESS DEPOSITION OF NICKEL; 19 ELECTROCHEMICAL SYNTHESIS OF METAL ALLOYS FOR MAGNETIC RECORDING SYSTEMS; 20 ELECTROLESS DEPOSITION OF PALLADIUM AND PLATINUM; 21 ELECTROLESS DEPOSITION OF GOLD; 22 ELECTROLESS DEPOSITION OF ALLOYS; 23 PREPARATION FOR DEPOSITION; 24 MANUFACTURING TOOLS; 25 MONITORING AND CONTROL 327 $a26 ENVIRONMENTAL ASPECTS OF ELECTRODEPOSITION27 APPLICATIONS TO MAGNETIC RECORDING AND MICROELECTRONIC TECHNOLOGIES; 28 MICROELECTROMECHANICAL SYSTEMS; 29 ANALYSIS OF ELECTROPLATED FILMS USING DUAL-BEAM FIB/SEM AND TEM TECHNIQUES; 30 IONIC LIQUID TREATMENTS FOR ENHANCED CORROSION RESISTANCE OF MAGNESIUM-BASED SUBSTRATES; APPENDIX; INDEX 330 $a The definitive resource for electroplating, now completely up to date With advances in information-age technologies, the field of electroplating has seen dramatic growth in the decade since the previous edition of Modern Electroplating was published. This expanded new edition addresses these developments, providing a comprehensive, one-stop reference to the latest methods and applications of electroplating of metals, alloys, semiconductors, and conductive polymers. With special emphasis on electroplating and electrochemical plating in nanotechnologies, data storage, and medical app 410 4$aThe ECS Series of Texts and Monographs 606 $aElectroplating 606 $aMetals$xFinishing 615 0$aElectroplating. 615 0$aMetals$xFinishing. 676 $a671.7/32 701 $aPaunovic$b Milan$0563943 701 $aSchlesinger$b Mordechay$0563944 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910826412903321 996 $aModern electroplating$94050373 997 $aUNINA