LEADER 02846nam 22005651 450 001 9910822485203321 005 20240405122657.0 010 $a3-03813-208-X 035 $a(CKB)2670000000348181 035 $a(EBL)1869212 035 $a(SSID)ssj0001127799 035 $a(PQKBManifestationID)11717880 035 $a(PQKBTitleCode)TC0001127799 035 $a(PQKBWorkID)11151998 035 $a(PQKB)11395528 035 $a(MiAaPQ)EBC1869212 035 $a(Au-PeEL)EBL1869212 035 $a(CaPaEBR)ebr10777856 035 $a(OCoLC)897070548 035 $a(EXLCZ)992670000000348181 100 $a20131101d2008 uy 0 101 0 $aeng 135 $aurcnu|||||||| 181 $ctxt 182 $cc 183 $acr 200 00$aDefects and diffusion in semiconductors$hXI $ean annual retrospective /$fD.J. Fisher 205 $a1st ed. 210 1$aStafa-Zuerich, Switzerland :$cTTP, Trans Tech Publications,$d[2008] 210 4$dİ2008 215 $a1 online resource (160 p.) 225 1 $aDefects and diffusion forum,$x1012-0386 ;$vv. 282 300 $aDescription based upon print version of record. 311 $a3-908451-63-9 320 $aIncludes bibliographical references and indexes. 327 $aDefects and Diffusion in Semicondutors, 2009; Table of Contents; Structural and Electron-Hopping Studies of Pr and Nd Substituted La2/3Ba1/3MnO3 Manganites; Recrystallization Annealing of Cold Rolled 9Cr 1Mo Ferritic Steel Containing Silicon; Quantitative Concept for Morphological Stability Analysis of Liquid-Solid Interface in Rapid Solidification of Dilute Binary Alloys; Studies of the Spin Hamiltonian Parameters for NiX2 and CdX2:Ni2+ (X=Cl, Br); Abstracts; Keywords Index; Authors Index 330 $aThis eleventh volume in the series covering the latest results in the field includes abstracts of papers which have appeared since the publication of Annual Retrospective X (Volume 272). As well as the 295 metals abstracts, the issue includes - in line with the new editorial policy of including original papers on all of the major material groups: ""Structural and Electron-Hopping Studies of Pr- and Nd-Substituted La2/3Ba1/3MnO3 Manganites"" (H.Abdullah and S.A.Halim), ""Recrystallization Annealing of Cold-Rolled 9Cr-1Mo Ferritic Steel Containing Silicon"" (M.N.Mungole, M.Surender, R.Balasubram 410 0$aDiffusion and defect data.$nPt. A,$pDefect and diffusion forum ;$vv. 282. 606 $aSemiconductors$xDefects 606 $aSemiconductors$xDiffusion 615 0$aSemiconductors$xDefects. 615 0$aSemiconductors$xDiffusion. 701 $aFisher$b D. J$0727312 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910822485203321 996 $aDefects and diffusion in semiconductors$94040652 997 $aUNINA