LEADER 00809nam0-22003011i-450- 001 990003262600403321 005 20001010 035 $a000326260 035 $aFED01000326260 035 $a(Aleph)000326260FED01 035 $a000326260 100 $a20000920d1961----km-y0itay50------ba 101 0 $aita 105 $ay-------001yy 200 1 $aDISSESTO DELL'AGRICOLTURA ITALIANA$eProposte di Ricostruzione 210 $aRoma$cPantera$d1961 215 $app. 82 610 0 $aStrutture e Politiche Agrarie 676 $a047.005 700 1$aGaddini,$bPiero$0376581 801 0$aIT$bUNINA$gRICA$2UNIMARC 901 $aBK 912 $a990003262600403321 952 $a047.005.GAD$b382$fDECGE 959 $aDECGE 996 $aDISSESTO DELL'AGRICOLTURA ITALIANA$9451068 997 $aUNINA DB $aING01 LEADER 02198nam 2200637 450 001 9910460735703321 005 20200520144314.0 010 $a1-118-47516-X 010 $a1-118-47517-8 035 $a(CKB)3710000000441474 035 $a(EBL)2072524 035 $a(SSID)ssj0001515090 035 $a(PQKBManifestationID)12532311 035 $a(PQKBTitleCode)TC0001515090 035 $a(PQKBWorkID)11480498 035 $a(PQKB)10197251 035 $a(PQKBManifestationID)16203434 035 $a(PQKB)22878007 035 $a(DLC) 2015019913 035 $a(MiAaPQ)EBC2072524 035 $a(PPN)189843691 035 $a(Au-PeEL)EBL2072524 035 $a(CaPaEBR)ebr11072198 035 $a(CaONFJC)MIL809598 035 $a(OCoLC)913331485 035 $a(EXLCZ)993710000000441474 100 $a20150716h20162016 uy 0 101 0 $aeng 135 $aur||||||||||| 181 $ctxt 182 $cc 183 $acr 200 00$aAmerican film history $eselected readings, origins to 1960 /$fedited by Cynthia Lucia, Roy Grundmann and Art Simon 210 1$aChichester, [England] :$cWiley Blackwell,$d2016. 210 4$dİ2016 215 $a1 online resource (1847 p.) 300 $aDescription based upon print version of record. 311 $a1-118-47513-5 320 $aIncludes bibliographical references at the end of each chapters and index. 327 $av. 1. Origins to 1960 -- 330 $a"Covers a broad range of topics ranging from the early 1900s Nickelodeon, silent film and its iconic figures such as Charlie Chaplin, to the coming of sound, genres, studio moguls, and the Cold War blacklist"--$cProvided by publisher. 606 $aMotion pictures$zUnited States$xHistory$y20th century 608 $aElectronic books. 615 0$aMotion pictures$xHistory 676 $a791.430973 686 $aPER004030$2bisacsh 702 $aLucia$b Cynthia A. Barto$g(Cynthia Anne Barto), 702 $aGrundmann$b Roy$f1963- 702 $aSimon$b Arthur 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910460735703321 996 $aAmerican film history$92469320 997 $aUNINA LEADER 05556nam 2200673Ia 450 001 9910813686603321 005 20230802012900.0 010 $a1-283-59361-0 010 $a9786613906069 010 $a981-4307-05-X 035 $a(CKB)2560000000093371 035 $a(EBL)1019629 035 $a(OCoLC)809977899 035 $a(SSID)ssj0000737867 035 $a(PQKBManifestationID)12331828 035 $a(PQKBTitleCode)TC0000737867 035 $a(PQKBWorkID)10789109 035 $a(PQKB)10830925 035 $a(MiAaPQ)EBC1019629 035 $a(WSP)00002755 035 $a(Au-PeEL)EBL1019629 035 $a(CaPaEBR)ebr10596921 035 $a(CaONFJC)MIL390606 035 $a(EXLCZ)992560000000093371 100 $a20120830d2012 uy 0 101 0 $aeng 135 $aurcuu|||uu||| 181 $ctxt 182 $cc 183 $acr 200 00$aIndustrial accelerators and their applications$b[electronic resource] /$fedited by Robert W. Hamm, Marianne E. Hamm 210 $aHackensack, NJ $cWorld Scientific Pub.$d2012 215 $a1 online resource (436 p.) 300 $aDescription based upon print version of record. 311 $a981-4307-04-1 320 $aIncludes bibliographical references and index. 327 $aDedication; CONTENTS; 1. Introduction; Introduction to the Beam Business Robert W. Hamm and Marianne E. Hamm; Chapter 1. Ion Implantation for Fabrication of Semiconductor Devices and Materials Michael I. Current; 1. Introduction; 2. Applications of Ion Implantation: Devices and Materials; 2.1 Pre-amorphization; 2.2 Cocktail implants; 2.3 Carbon implants for tensile strained nMOS; 2.4 Oxygen implants for direct formation of Silicon-on-Insulator (SOI) wafers; 2.5 Hydrogen implants for formation of SOI wafers by layer transfer; 3. Accelerator Designs; 3.1 Beamline system types 327 $a3.2 Accel-decel beamlines 3.3 MeV beamlines; 3.4 Plasma immersion and ion shower implanters; 3.5 SIMOX high-current, high-temperature implanters; 4. Ion Source Designs; 4.1 Special ion sources: SIMOX, molecular ions, non-volatile elements, and large-area beams; 5. Scanning Methods; 5.1 Beam deflection and wafer motion in orthogonal directions; 5.2 Spinning wheel and pendulum wafer scanning; 6. New Directions: Gas Cluster Ions, Photovoltaic Cell Doping, and MeV Protons for Si Membrane Cutting; 6.1 Gas cluster ions; 6.2 Doping of Si-based photovoltaic cells 327 $a6.2.1 Alternatives to implant doping for PV cells 6.2.2 Advanced PV cells; 6.3 High-current, multi-MeV proton beams for fabrication of thin Si PV membranes; 7. Implantation into Metals and Biomaterials; 7.1 Metals: hardness, friction, and corrosion; 7.2 Biomaterials treated by plasma immersion implantation and deposition; 8. Summary; Acknowledgements; References; Chapter 2. Electron Beam Materials Processing Donald E. Powers; 1. Introduction; 2. Electron Beam Equipment; 3. Electron Beam Welding; 3.1 Large steam turbines; 3.2 High efficiency impellers; 3.3 Speed gears; 3.4 Drive rings 327 $a4. EB Cutting and Drilling 5. EB Heat Treating; 6. EB Melting and Casting; 7. Summary and Future Trends; Acknowledgements; References; Chapter 3. Electron Beam Materials Irradiators Marshall R. Cleland; 1. Introduction; 2. Physical Properties of High-Energy Electrons and X-Rays; 2.1 High-energy electrons; 2.2 High-energy X-rays; 2.3 Radiation dosimetry; 2.4 Dose versus electron beam power; 2.5 Dose versus electron beam current; 3. Industrial Electron Accelerators; 3.1 Low-energy accelerators; 3.2 Medium-energy accelerators; 3.3 High-energy accelerators 327 $a4. Major Applications of Industrial EB Irradiators4.1 Cross-linking of materials; 4.1.1 Wire and cable insulation; 4.1.2 Heat-shrinkable plastic tubing and film; 4.1.3 Curing of inks, coatings, and adhesives; 4.1.4 Automobile tires; 4.1.5 Polyethylene foam; 4.2 Radiation sterilization of medical devices; 4.3 Irradiation of foods; 5. Other EB Irradiation Applications; 5.1 Treatment of waste materials; 5.2 Cleaning of stack gases; 5.3 Curing of composite materials; 5.4 Silicon-carbide fiber manufacturing; 5.5 Production of fuel cells; 5.6 Cross-linking of PTFE and rubber sheeting 327 $a5.7 Seed and soil disinfestation 330 $aThis unique new book is a comprehensive review of the many current industrial applications of particle accelerators, written by experts in each of these fields. Readers will gain a broad understanding of the principles of these applications, the extent to which they are employed, and the accelerator technology utilized. The book also serves as a thorough introduction to these fields for non-experts and laymen.Due to the increased interest in industrial applications, there is a growing interest among accelerator physicists and many other scientists worldwide in understanding how accelerators ar 606 $aElectron accelerators$xIndustrial applications 606 $aIonizing radiation$xIndustrial applications 606 $aElectron beams$xIndustrial applications 615 0$aElectron accelerators$xIndustrial applications. 615 0$aIonizing radiation$xIndustrial applications. 615 0$aElectron beams$xIndustrial applications. 676 $a539.73 701 $aHamm$b Robert Wray$01671134 701 $aHamm$b Marianne Elizabeth$01671135 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910813686603321 996 $aIndustrial accelerators and their applications$94033482 997 $aUNINA LEADER 02425nam 2200649 a 450 001 9910810939903321 005 20240410095815.0 010 $a1-4462-2130-X 010 $a1-280-37081-5 010 $a9786610370818 010 $a1-4129-3245-9 035 $a(CKB)1000000000031206 035 $a(EBL)254805 035 $a(OCoLC)191036559 035 $a(SSID)ssj0000114770 035 $a(PQKBManifestationID)11143178 035 $a(PQKBTitleCode)TC0000114770 035 $a(PQKBWorkID)10126157 035 $a(PQKB)11376107 035 $a(MiAaPQ)EBC254805 035 $a(OCoLC)1007859378 035 $a(StDuBDS)EDZ0000067627 035 $a(Au-PeEL)EBL254805 035 $a(CaPaEBR)ebr10080969 035 $a(CaONFJC)MIL37081 035 $a(OCoLC)70774203 035 $a(OCoLC)1190770374 035 $a(FINmELB)ELB130983 035 $a(EXLCZ)991000000000031206 100 $a20120405d2003 fy 0 101 0 $aeng 135 $aur||||||||||| 181 $ctxt 182 $cc 183 $acr 200 10$aBrief Gestalt therapy$b[electronic resource] /$fGaie Houston 205 $a1st ed. 210 $aLondon $cSAGE$dc2003 215 $a1 online resource (154 p.) 225 1 $aBrief therapies series 300 $aDescription based upon print version of record. 311 $a0-7619-7349-4 311 $a0-7619-7348-6 320 $aIncludes bibliographical references (p. [145]-149) and index. 327 $aCover; Contents; Chapter 1 - Overview; Chapter 2 - The Gestalt Approach: Theory Related to Brief Intervention; Chapter 3 - The Assessment; Appendix A; Chapter 4 - The Beginning; Appendix B; Chapter 5 - The Middle; Chapter 6 - The Ending; Chapter 7 - A BGT Individual Case Study; Chapter 8 - The Brief Gestalt Therapy Group; Appendix C; Chapter 9 - A BGT Group Case Study; Chapter 10 - Evidence, Authority and Now in BGT; References; Index 330 8 $aThis text sets out the basic theory and principles of Gestalt therapy and demonstrates how the Gestalt approach can be used effectively in brief interventions with clients. 410 0$aBrief therapies series. 606 $aGestalt therapy 615 0$aGestalt therapy. 676 $a616.89143 700 $aHouston$b Gaie$f1933-$01718321 801 0$bStDuBDS 801 1$bStDuBDS 906 $aBOOK 912 $a9910810939903321 996 $aBrief Gestalt therapy$94115168 997 $aUNINA