LEADER 03702nam  2200625Ia 450 
001 9910810476803321
005 20200520144314.0
010   $a1-61761-770-9
035   $a(CKB)2560000000067928
035   $a(EBL)3017744
035   $a(SSID)ssj0000431623
035   $a(PQKBManifestationID)12192011
035   $a(PQKBTitleCode)TC0000431623
035   $a(PQKBWorkID)10493294
035   $a(PQKB)10222625
035   $a(MiAaPQ)EBC3017744
035   $a(Au-PeEL)EBL3017744
035   $a(CaPaEBR)ebr10654715
035   $a(OCoLC)670429463
035   $a(EXLCZ)992560000000067928
100   $a20100129d2010      uy         0
101 0 $aeng
135   $aur|n|---|||||
181   $ctxt
182   $cc
183   $acr
200 10$aZnO nanostructures deposited by laser ablation /$fD. Valerini ... [et al.]
205   $a1st ed.
210   $aHauppauge, NY $cNova Science Publishers$dc2010
215   $a1 online resource (80 p.)
225 0 $aNanotechnology science and technology
300   $aDescription based upon print version of record.
311   $a1-61668-034-2 
320   $aIncludes bibliographical references (p. [59]-63) and index.
327   $a""ZNO NANOSTRUCTURES DEPOSITED BY LASER ABLATION""; ""ZNO NANOSTRUCTURES DEPOSITED BY LASER ABLATION""; ""CONTENTS ""; ""PREFACE ""; ""INTRODUCTION""; ""1.1. PROPERTIES AND APPLICATIONS OF ZINC OXIDE AND ITS NANOSTRUCTURES ""; ""1.2. GROWTH TECHNIQUES FOR ZINC OXIDE NANOSTRUCTURES ""; ""ZINC OXIDE NANOSTRUCTURES BY LASER ABLATION: AN OVERVIEW ""; ""2.1. THE PULSED LASER DEPOSITION TECHNIQUE ""; "" 2.2. NANOSTRUCTURED ZINC OXIDE BY PLD IN THE WORLD ""; ""A) Kyushu University (Fukuoka, Japan), Fudan University (Shanghai, China), University of Miyazaki (Miyazaki, Japan) ""
327   $a""A1) Refs. [100,101,102,103] """"A2) Refs. [104,105,106,107,108,109] ""; ""A3) Ref. [110] ""; ""B) University of Bristol (Bristol, UK), Refs. 111,112,113,114,115] ""; ""C) University of Delhi (Delhi, India), University of Puerto Rico (San Juan, Puerto Rico), Harbin Institute of Technology (Harbin, China) ""; ""C1) Refs. [116,117] ""; ""C2) Refs. [118] ""; ""D) Osaka University (Osaka, Japan), Chiang Mai University (Muang Chiang Mai, Thailand), ref. [119]""; ""E) Korea Institute of Science and Technology (Seoul, Republic of Korea), ref. [120] ""
327   $a""K) University of Canterbury (Christchurch, New Zealand), The Macdiarmid Institute of Advanced Materials and Nanotechnology (New Zealand), Ref. [129] """"L) University of Technology (Dalian, China), ref. [130] ""; ""M) University of Salento (Lecce, Italy), refs. [131,132] ""; ""RESULTS ""; "" 3.1. EXPERIMENTAL PLD SET-UP AND DEPOSITION PARAMETERS ""; ""3.2. MORPHOLOGY ""; ""3.2.a. KrF-Deposited Samples (I?» = 248 nm, E = 5 eV) ""; ""3.2.b. ArF-deposited Samples (I?» = 193 nm, E = 6.42 eV) ""; ""3.2.c. Comparison between KrF and ArF -Deposited Samples ""
327   $a""3.3. SUMMARY OF OTHER CHARACTERIZATIONS """"3.4. GAS SENSING TESTS ""; ""CONCLUSION ""; ""ACKNOWLEDGMENTS ""; ""REFERENCES ""; ""INDEX ""
410  0$aNanotechnology Science and Technology
606   $aNanostructured materials$xDesign and construction
606   $aPulsed laser deposition
606   $aZinc oxide thin films
615  0$aNanostructured materials$xDesign and construction.
615  0$aPulsed laser deposition.
615  0$aZinc oxide thin films.
676   $a620/.5
676   $a620/.5
700   $aValerini$b D$01614688
801  0$bMiAaPQ
801  1$bMiAaPQ
801  2$bMiAaPQ
906   $aBOOK
912   $a9910810476803321
996   $aZnO nanostructures deposited by laser ablation$93944590
997   $aUNINA