LEADER 04988nam 2200661 450 001 9910787996903321 005 20230803195537.0 010 $a0-19-756318-X 010 $a0-19-936463-X 010 $a0-19-982618-8 035 $a(CKB)2670000000545511 035 $a(EBL)1657790 035 $a(StDuBDS)EDZ0002341380 035 $a(Au-PeEL)EBL1657790 035 $a(CaPaEBR)ebr10852027 035 $a(CaONFJC)MIL584402 035 $a(OCoLC)875097952 035 $a(MiAaPQ)EBC1657790 035 $a(EXLCZ)992670000000545511 100 $a20140329h20142014 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $2rdacontent 182 $2rdamedia 183 $2rdacarrier 200 10$aComputational thinking in sound $eteaching the art and science of music and technology /$fGena R. Greher and Jesse M. Heines 210 1$aNew York :$cOxford University Press,$d2014. 210 4$dİ2014 215 $a1 online resource (253 p.) 225 1 $aOxford scholarship online 300 $aPreviously issued in print: 2014. 311 $a0-19-982617-X 311 $a0-19-982619-6 320 $aIncludes bibliographical references and index. 327 $aCover; Computational Thinking in Sound Teaching the Art and Science of Music and Technology; Copyright; Dedication; CONTENTS; ACKNOWLEDGMENTS; PREFACE; THINKING AND TEACHING BEYOND OUR DISCIPLINE-SPECIFIC SILOS; HELPING STUDENTS LEARN ABOUT TECHNOLOGY THROUGH THEIR INTERACTIONS WITH MUSIC; HELPING STUDENTS SEE THE CONNECTION BETWEEN TECHNOLOGY AND MUSIC; TODAY'S COMPLEX PROBLEMS REQUIRE MULTIDISCIPLINARY SOLUTIONS; COMPUTATIONAL THINKING FOR EVERYON; BIBLIOGRAPHY; ABOUT THE COMPANION WEBSITE; Computational Thinking in Sound 327 $aChapter 1: Computational Thinking in Music Courses: How to Get Artsy Types to Start Thinking like Geeks and Vice VersaWHAT IS COMPUTATIONAL THINKING?; OPERATIONALIZING COMPUTATIONAL THINKING; A First Activity to Introduce CT; COMPUTATIONAL THINKING IN MUSICAL FLOWCHARTS; Chunking and Connecting; STUDENT EXAMPLES; LOOKING AHEAD; BIBLIOGRAPHY; Chapter 2: Imagination and Creativity: The School-Based Paradox; WHO IS CREATIVE AND WHY DOES IT MATTER?; THE WHAT AND WHY OF EDUCATION; A BIT OF BACKGROUND 327 $aBUILDING A BETTER MOUSETRAP: LEARNING ENVIRONMENTS THAT FOSTER IMAGINATIVE AND CREATIVE EXPERIENCESTOWARD CREATING MEANINGFUL PROJECTS; Playful and Fun; Collaboration; Exploration and Discovery; Risk Taking and Curiosity; THE YIN AND YANG OF CREATIVITY AND THE COLLABORATIVE PROCESS; BIBLIOGRAPHY; Chapter 3: Interdisciplinary Teaching and Learning: Two Heads Might Actually Be Better than One; YESTERDAY AND TODAY; DEFINING INTERDISCIPLINARY TEACHING; "SYNCHRONIZED" VERSUS "HYBRID" COURSES; LEARNING FROM EXPERIENCE; BENEFITS TO STUDENTS; BENEFITS TO THE PROFESSORS; BIBLIOGRAPHY 327 $aChapter 4: Notation and Representation: How We Get 'Em to Crack the CodeGATEWAYS, BARRIERS, AND BOUNDARIES; FOUND INSTRUMENTS PROJECT: GOALS AND OVERVIEW; A BIT OF BACKGROUND; SYNCHRONIZED CLASS VERSION; Part 1: The Music Assignment; Part 2: The Computer Science Assignment; HYBRID CLASS VERSION; From Two Parts to Three; From Exercises to Music; THEME, VARIATIONS, AND COMPUTATIONAL THINKING; BIBLIOGRAPHY; Appendix for Chapter 4; ADDITIONAL FOUND INSTRUMENTS AND NOTATION EXAMPLES: From the Synchronized Classes; From the Hybrid Class 327 $aChapter 5: Getting Them Started I Didn't Know You Could Do That with a ComputerJUST WHAT IS A COMPUTER, ANYWAY?; AUDACITY: THE STANDARD IN FREE MUSIC EDITING; GETTING MUSIC INTO AND OUT OF AUDACITY; GAINING COMPUTATIONAL THINKING SKILLS THROUGH AUDACITY; HOW COULD YOU HAVE THE AUDACITY TO DO THAT TO MY SONG?!?; AN EXAMPLE FROM OUR COURSE: THE AUDIO-ETHNOGRAPHY PROJECT; THE VALUE OF PERFORMANCE; APPENDIX; Downloading and Installing Audacity with the LAME MP3 Encoder; BIBLIOGRAPHY; Chapter 6: Platforms and Tools: Anything You Can Do, I Need to Do Cheaper; GETTING INTO THE GAME; SOUND EDITING 327 $aAudacity 330 8 $aThis text, for music fundamentals educators, is devoted specifically to music, sound, and technology. The work offers practical guidance on creating an interdisciplinary classroom program, and includes numerous student activities at the intersection of computing and music. 410 0$aOxford scholarship online. 606 $aMusic$xInstruction and study$xTechnological innovations 606 $aInterdisciplinary approach in education 606 $aComputer composition 615 0$aMusic$xInstruction and study$xTechnological innovations. 615 0$aInterdisciplinary approach in education. 615 0$aComputer composition. 676 $a780.71 700 $aGreher$b Gena R.$01551995 702 $aHeines$b Jesse M. 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910787996903321 996 $aComputational thinking in sound$93811759 997 $aUNINA LEADER 05254nam 2200613Ia 450 001 9911006867503321 005 20200520144314.0 010 $a9786612002755 010 $a1-282-00275-9 010 $a1-282-00276-7 010 $a0-8155-1763-7 010 $a1-59124-079-4 035 $a(CKB)111056552537490 035 $a(EBL)566701 035 $a(OCoLC)729017802 035 $a(SSID)ssj0000072232 035 $a(PQKBManifestationID)11971877 035 $a(PQKBTitleCode)TC0000072232 035 $a(PQKBWorkID)10095725 035 $a(PQKB)10165753 035 $a(MiAaPQ)EBC566701 035 $a(EXLCZ)99111056552537490 100 $a19971010d1998 uy 0 101 0 $aeng 135 $aur|n|---||||| 181 $ctxt 182 $cc 183 $acr 200 10$aHandbook of physical vapor deposition (PVD) processing $efilm formation, adhesion, surface preparation and contamination control /$fby Donald M. Mattox 210 $aWestwood, NJ $cNoyes Publications$dc1998 215 $a1 online resource (947 p.) 300 $aDescription based upon print version of record. 311 $a0-8155-1422-0 320 $aIncludes bibliographical references and index. 327 $aFront Cover; Handbook of Physical Vapor Depositon (PVD) Processing: Film Formation, Adhesion, Surface Preparation and Contamination Control; Copyright Page; Dedication; Table of Contents; Chapter 1. Introduction; 1.1 SURFACE ENGINEERING; 1.2 THIN FILM PROCESSING; 1.3 PROCESS DOCUMENTATION; 1.4 SAFETY AND ENVIRONMENTAL CONCERNS; 1.5 UNITS; 1.6 SUMMARY; FURTHER READING; REFERENCES; Chapter 2. Substrate ("Real") Surfaces and Surface Modification; 2.1 INTRODUCTION; 2.2 MATERIALS AND FABRICATION; 2.3 ATOMIC STRUCTURE AND ATOM-PARTICLE INTERACTIONS 327 $a2.4 CHARACTERIZATION OF SURFACES AND NEAR-SURFACE REGIONS2.5 BULK PROPERTIES; 2.6 MODIFICATION OF SUBSTRATE SURFACES; 2.7 SUMMARY; FURTHER READING; REFERENCES; Chapter 3. The Low-Pressure Gas and Vacuum Processing Environment; 3.1 INTRODUCTION; 3.2 GASES AND VAPORS; 3.3 GAS-SURFACE INTERACTIONS; 3.4 VACUUM ENVIRONMENT; 3.5 VACUUM PROCESSING SYSTEMS; 3.6 VACUUM PUMPING; 3.7 VACUUM AND PLASMA COMPATIBLE MATERIALS; 3.8 ASSEMBLY; 3.9 EVALUATING VACUUM SYSTEM PERFORMANCE; 3.10 PURCHASING A VACUUM SYSTEM FOR PVD PROCESSING; 3.11 CLEANING OF VACUUM SURFACES; 3.12 SYSTEM-RELATED CONTAMINATION 327 $a3.13 PROCESS-RELATED CONTAMINATION3.14 TREATMENT OF SPECIFIC MATERIALS; 3.15 SAFETY ASPECTS OF VACUUM TECHNOLOGY; 3.16 SUMMARY; FURTHER READING; REFERENCES; Chapter 4. The Low-Pressure Plasma Processing Environment; 4.1 INTRODUCTION; 4.2 THE PLASMA; 4.3 PLASMA-SURFACE INTERACTIONS; 4.4 CONFIGURATIONS FOR GENERATING PLASMAS; 4.5 ION AND PLASMA SOURCES; 4.6 PLASMA PROCESSING SYSTEMS; 4.7 PLASMA-RELATED CONTAMINATION; 4.8 SOME SAFETY ASPECTS OF PLASMA PROCESSING; 4.9 SUMMARY; FURTHER READING; REFERENCES; Chapter 5. Vacuum Evaporation and Vacuum Deposition; 5.1 INTRODUCTION 327 $a5.2 THERMAL VAPORIZATION5.3 THERMAL VAPORIZATION SOURCES; 5.4 TRANSPORT OF VAPORIZED MATERIAL; 5.5 CONDENSATION OF VAPORIZED MATERIAL; 5.6 MATERIALS FOR EVAPORATION; 5.7 VACUUM DEPOSITION CONFIGURATIONS; 5.8 PROCESS MONITORING AND CONTROL; 5.9 CONTAMINATION FROM THE VAPORIZATION SOURCE; 5.10 ADVANTAGES AND DISADVANTAGES OF VACUUM DEPOSITION; 5.11 SOME APPLICATIONS OF VACUUM DEPOSITION; 5.12 GAS EVAPORATION AND ULTRAFINE PARTICLES; 5.13 OTHER PROCESSES; 5.14 SUMMARY; FURTHER READING; REFERENCES; Chapter 6. Physical Sputtering and Sputter Deposition (Sputtering; 6.1 INTRODUCTION 327 $a6.2 PHYSICAL SPUTTERING6.3 SPUTTERING CONFIGURATIONS; 6.4 TRANSPORT OF THE SPUTTER-VAPORIZED SPECIES; 6.5 CONDENSATION OF SPUTTERED SPECIES; 6.6 SPUTTER DEPOSITION GEOMETRIES; 6.7 TARGETS AND TARGET MATERIALS; 6.8 PROCESS MONITORING AND CONTROL; 6.9 CONTAMINATION DUE TO SPUTTERING; 6.10 ADVANTAGES AND DISADVANTAGES OF SPUTTER DEPOSITION; 6.11 SOME APPLICATIONS OF SPUTTER DEPOSITION; 6.12 SUMMARY; FURTHER READING; REFERENCES; Chapter 7. Arc Vapor Deposition; 7.1 INTRODUCTION; 7.2 ARCS; 7.3 ARC SOURCE CONFIGURATIONS; 7.4 REACTIVE ARC DEPOSITION; 7.5 ARC MATERIALS 327 $a7.6 ARC VAPOR DEPOSITION SYSTEM 330 $aThis book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum te 606 $aVapor-plating$vHandbooks, manuals, etc 606 $aMetals$xFinishing$vHandbooks, manuals, etc 615 0$aVapor-plating 615 0$aMetals$xFinishing 676 $a671.735 700 $aMattox$b D. M$0964240 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9911006867503321 996 $aHandbook of physical vapor deposition (PVD) processing$94388576 997 $aUNINA