LEADER 01877nam 2200553 a 450 001 9910778507903321 005 20230331004940.0 010 $a1-280-20336-6 010 $a9786610203369 010 $a0-309-58375-6 010 $a0-585-08463-7 035 $a(CKB)110986584751116 035 $a(OCoLC)43475627 035 $a(CaPaEBR)ebrary10055392 035 $a(SSID)ssj0000222460 035 $a(PQKBManifestationID)11175776 035 $a(PQKBTitleCode)TC0000222460 035 $a(PQKBWorkID)10169814 035 $a(PQKB)11765997 035 $a(MiAaPQ)EBC3376299 035 $a(Au-PeEL)EBL3376299 035 $a(CaPaEBR)ebr10055392 035 $a(OCoLC)923262698 035 $a(EXLCZ)99110986584751116 100 $a19911004d1991 uy 0 101 0 $aeng 135 $aurcn||||||||| 181 $ctxt 182 $cc 183 $acr 200 10$aPlasma processing of materials$b[electronic resource] $escientific opportunities and technological challenges /$fPanel on Plasma Processing of Materials, Plasma Science Committee, Board on Physics and Astronomy, Commission on Physical Sciences, Mathematics, and Applications, National Research Council 210 $aWashington, D.C. $cNational Academy Press$d1991 215 $a1 online resource (87 p.) 300 $aBibliographic Level Mode of Issuance: Monograph 311 $a0-309-04597-5 606 $aPlasma engineering 606 $aMicroelectronics$xMaterials$xEffect of radiation on 606 $aSurfaces (Technology) 615 0$aPlasma engineering. 615 0$aMicroelectronics$xMaterials$xEffect of radiation on. 615 0$aSurfaces (Technology) 676 $a621.044 801 0$bMiAaPQ 801 1$bMiAaPQ 801 2$bMiAaPQ 906 $aBOOK 912 $a9910778507903321 996 $aPlasma processing of materials$93805764 997 $aUNINA