LEADER 01632oam  2200493   450 
001 9910717089303321
005 20211207162058.0
035   $a(CKB)5470000002527309
035   $a(OCoLC)760785571
035   $a(EXLCZ)995470000002527309
100   $a20111111j198203    ua             0
101 0 $aeng
135   $aur|||||||||||
181   $ctxt$2rdacontent
182   $cc$2rdamedia
183   $acr$2rdacarrier
200 10$aEffect of vacuum processing on outgassing within an orbiting molecular shield /$fR.A. Outlaw
210  1$aWashington, DC :$cNational Aeronautics and Space Administration, Scientific and Technical Information Branch,$dMarch 1982.
215   $a1 online resource (approximately 16 pages) $cillustrations
225 1 $aNASA/TP ;$v1980
300   $a"March 1982."
320   $aIncludes bibliographical references (pages 10-11).
606   $aOutgassing$2nasat
606   $aOrbitals$2nasat
606   $aMolecular orbitals$2fast
606   $aVacuum technology$2fast
615  7$aOutgassing.
615  7$aOrbitals.
615  7$aMolecular orbitals.
615  7$aVacuum technology.
700   $aOutlaw$b R. A.$01399504
712 02$aUnited States.$bNational Aeronautics and Space Administration.$bScientific and Technical Information Branch,
801  0$bOCLCE
801  1$bOCLCE
801  2$bOCLCQ
801  2$bOCLCF
801  2$bOCLCQ
801  2$bOCLCO
801  2$bOCLCQ
801  2$bGPO
906   $aBOOK
912   $a9910717089303321
996   $aEffect of vacuum processing on outgassing within an orbiting molecular shield$93501554
997   $aUNINA