LEADER 01816oam 2200553 450 001 9910716960203321 005 20211108121337.0 035 $a(CKB)5470000002526593 035 $a(OCoLC)761359415 035 $a(EXLCZ)995470000002526593 100 $a20111115j196711 ua 0 101 0 $aeng 135 $aur||||||||||| 181 $ctxt$2rdacontent 182 $cc$2rdamedia 183 $acr$2rdacarrier 200 10$aAutomated data collection system applied to Hall effect and resistivity measurements /$fby Ralph D. Thomas 210 1$a[Washington, D.C.] :$cNational Aeronautics and Space Administration,$d[November 1967]. 215 $a1 online resource (25 pages) $cillustrations 225 1 $aNASA/TM ;$vX-1464 320 $aIncludes bibliographical references (page 25). 606 $aElectrical resistivity$2nasat 606 $aHall effect$2nasat 606 $aSemiconductor devices$2nasat 606 $aTransport properties$2nasat 606 $aCadmium sulfides$2nasat 606 $aCryogenic equipment$2nasat 606 $aData acquisition$2nasat 606 $aThin films$2nasat 615 7$aElectrical resistivity. 615 7$aHall effect. 615 7$aSemiconductor devices. 615 7$aTransport properties. 615 7$aCadmium sulfides. 615 7$aCryogenic equipment. 615 7$aData acquisition. 615 7$aThin films. 700 $aThomas$b Ralph D.$098558 712 02$aUnited States.$bNational Aeronautics and Space Administration, 801 0$bOCLCE 801 1$bOCLCE 801 2$bOCLCQ 801 2$bOCLCO 801 2$bOCLCQ 801 2$bGPO 906 $aBOOK 912 $a9910716960203321 996 $aAutomated data collection system applied to Hall effect and resistivity measurements$93537157 997 $aUNINA